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Preparation and characteristics of a chemically amplified silicone-based negative resist.

机译：化学扩增的硅氧烷基负抗蚀剂的制备和特征。

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Akinobu Tanaka; Hiroshi Ban; Jiro Nakamura; Yoshio Kawai;
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年度 1993
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1. Study of Nanometer Resolution Resist Slope for the UVIII Chemically Amplified Resist. [J] . A. Gerardino, M. Gentili, E. Di Fabrizio Microelectronic Engineering . 1999,第1a4期

机译：UVIII化学增强抗蚀剂的纳米分辨率抗蚀剂斜率研究。
2. Depth profile analysis of chemically amplified resist by using TOF-SIMS with gradient shaving preparations [J] . N. Man, H. Okumura, H. Oizumi, Applied Surface Science . 2004,第Jun期

机译：使用TOF-SIMS和梯度剃须制剂对化学放大抗蚀剂的深度分布进行分析
3. Modulation of Myelopoiesis In Vivo by Chemically Pure Preparations of Cell Wall Components from Gram-Negative Bacteria: Effects at Different Stages [J] . F. G. Staber, L. Tarcsay, P. Dukor Infection and immunity . 1978,第1期

机译：化学纯制革兰氏阴性细菌细胞壁成分体内对骨髓生成的调节：在不同阶段的影响。
4. Characteristics of a chemically amplified silicone-based negative resist in KrF excimer laser lithography [C] . Yoshio Kawai, NTT/LSI Labs., Atsugi-shi, Advances in Resist Technology and Processing IX . 1992

机译：KrF准分子激光光刻中化学放大的硅基负性抗蚀剂的特性
5. Exploration of non-chemically amplified resists based on dissolution inhibitors for 193 nm lithography. [D] . Baylav, Burak. 2010

机译：探索基于溶出抑制剂的非化学放大抗蚀剂，用于193 nm光刻。
6. Modulation of Myelopoiesis In Vivo by Chemically Pure Preparations of Cell Wall Components from Gram-Negative Bacteria: Effects at Different Stages [O] . F. G. Staber, L. Tarcsay, P. Dukor 1978

机译：化学纯制革兰氏阴性细菌细胞壁成分体内对骨髓生成的调节：在不同阶段的影响。
7. The Effect of Dissolution Inhibitors on the Dissolution Characteristics of a Chemically Amplified Three-Component Positive Resist. [O] . Hideo HORIBE, Teruhiko KUMADA, Shigeru KUBOTA 1996

机译：溶解抑制剂对化学扩增三组分正抗蚀剂溶出特性的影响。
8. Electroless Plating Tape for Video Tape Recording. Preparation and Characteristics of Chemically Deposited Co-P Tape [R] . Ito, K., Yokoyama, K., Muramatsu, S. 1970

机译：用于录像带录制的化学镀带。化学沉积Co-p胶带的制备及性能

Preparation and characteristics of a chemically amplified silicone-based negative resist.

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