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Effects of photon irradiation in UV and VUV regions during plasma processing of organic materials

机译：在有机材料的等离子体处理过程中，UV和VUV区域中光子辐照的影响

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Cho Ken; Takenaka Kosuke; Setsuhara Yuichi; Shiratani Masaharu; Sekine Makoto; Hori Masaru;
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年度 2013
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正文语种 eng
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1. Effects of photon irradiation in UV and VUV regions during plasma processing of organic materials [J] . CHO Ken, TAKENAKA Kosuke, SETSUHARA Yuichi, Transactions of JWRI . 2010 ,第2期

机译：在有机材料的等离子体处理过程中，UV和VUV区域中光子辐照的影响
2. Effects of photoirradiation in UV and VUV regions during plasma exposure to polymers [J] . Ken Cho, Yuichi Setsuhara, Kosuke Takenaka, Thin Solid Films . 2011 ,第20期

机译：等离子体暴露于聚合物期间，UV和VUV区域中的光辐射效应
3. Effects of Irradiation with Ions and Photons in Ultraviolet-Vacuum Ultraviolet Regions on Nano-Surface Properties of Polymers Exposed to Plasmas [J] . Ken Cho, Kosuke Takenaka, Yuichi Setsuhara, Japanese journal of applied physics . 2012 ,第1ISSUE2期

机译：紫外线-真空紫外线区域中离子和光子辐照对等离子体暴露聚合物纳米表面性能的影响
4. Features of the Sterilization by VUV/UV Irradiation of Low-Pressure Discharge Plasma [C] . Vyacheslav V. Tsiolko Plasma for bio-decontamination, medicine and food security . 2011

机译：低压放电等离子体的VUV / UV辐照杀菌特性
5. VUV/UV radiation interaction with silicon dioxide: Towards the next generation of 157 nm optical lithography materials. [D] . Haines, Christopher Dale. 2003

机译：VUV / UV辐射与二氧化硅的相互作用：走向下一代157 nm光学光刻材料。
6. High Refractive Organic–Inorganic Hybrid Films Prepared by Low Water Sol-Gel and UV-Irradiation Processes [O] . Hsiao-Yuan Ma, Tzong-Liu Wang, Pei-Yu Chang, 2016

机译：通过低水溶胶-凝胶和紫外线辐照工艺制备的高折射有机-无机杂化膜
7. VUV/UV/Chlorine as an Enhanced Advanced Oxidation Process for Organic Pollutant Removal from Water: Assessment with a Novel Mini-Fluidic VUV/UV Photoreaction System (MVPS) [O] . Li Mengkai, Qiang Zhimin, Hou Pin, 2016

机译：VUV / UV /氯作为增强的高级氧化工艺，用于去除水中的有机污染物：新型微型流体VUV / UV光反应系统（MVPS）的评估
8. Measurements of the Uv and Vuv Transmission of Optical Materials During High Energy Electron Irradiation [R] . Palma, G. E. 1972

机译：高能电子辐照过程中光学材料Uv和Vuv透射率的测量

Effects of photon irradiation in UV and VUV regions during plasma processing of organic materials

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