首页> 外文OA文献 >Electrical Properties of Very Thin Al2O3 Films Prepared by Magnetron Sputtering Enhanced with an Inductively Coupled rf Plasma

【2h】

Electrical Properties of Very Thin Al2O3 Films Prepared by Magnetron Sputtering Enhanced with an Inductively Coupled rf Plasma

机译：通过磁控溅射制备的非常薄的Al2O3膜的电性能，具有电感耦合的RF等离子体

代理获取

本网站仅为用户提供外文OA文献查询和代理获取服务，本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文，但由于OA文献来源多样且变更频繁，仍可能出现获取不到、文献不完整或与标题不符等情况，如果获取不到我们将提供退款服务。请知悉。

页面导航

著录项
引文网络
相似文献
相关主题

著录项

作者
T. Morita; T. Yamamoto; T. Kurauchi; M. Matsuura;
展开▼
作者单位

展开▼
年度 1998
总页数
原文格式 PDF
正文语种
中图分类

相似文献

外文文献
中文文献
专利

1. Microstructure, hardness and corrosion resistance of ZrN films prepared by inductively coupled plasma enhanced RF magnetron sputtering [J] . Liu F, Meng YD, Ren ZX, Plasma Science & Technology . 2008,第2期

机译：电感耦合等离子体增强射频磁控溅射制备ZrN薄膜的组织，硬度和耐蚀性
2. Microstructure, Hardness and Corrosion Resistance of ZrN Films Prepared by Inductively Coupled Plasma Enhanced RF Magnetron Sputtering [J] . 刘峰, 孟月东, 任兆杏, 等离子体科学和技术：英文版 . 2008,第002期

机译：电感耦合等离子增强射频磁控溅射制备ZrN薄膜的组织，硬度和耐蚀性
3. Microstructure, Hardness and Corrosion Resistance of ZrN Films Prepared by Inductively Coupled Plasma Enhanced RF Magnetron Sputtering [J] . LIU Feng, MENG Yuedong, REN Zhaoxing, 等离子体科学和技术（英文版） . 2008,第002期
4. STRUCTURAL AND ELECTRICAL PROPERTIES OF HYDROGENATED POLYCRYSTALLINE GERMANIUM THIN FILMS PREPARED BY RF MAGNETRON SPUTTERING FOR THIN FILM PHOTOVOLTAICS [C] . C. Tsao, J. Wong, P. Campbell, European Photovoltaic Solar Energy Conference . 2009

机译：RF磁控溅射薄膜光伏制备的氢化多晶锗薄膜的结构和电性能
5. Structural, magnetic and surface properties of RF magnetron sputtered undoped lanthanum manganite thin films. [D] . Sakhalkar, Varad Rajan. 2009

机译：射频磁控溅射未掺杂镧锰矿薄膜的结构，磁性和表面特性。
6. Processing and Study of Optical and Electrical Properties of (Mg Al) Co-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering for Photovoltaic Application [O] . Chayma Abed, Susana Fernández, Selma Aouida, 2020

机译：射频磁控溅射制备（MgAl）共掺杂ZnO薄膜的光电性能研究与研究
7. Dependence of Substrate DC Bias Voltage on Structural Properties of Nickel Thin Films Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma [O] . Kazuaki TAKESAKO, Yuta OKAYAMA, Keishi KAWABATA 2006

机译：基板DC偏置电压对镍薄膜结构性能的依赖性，具有磁控溅射，具有电感耦合等离子体辅助的多极磁等离子体限制

Electrical Properties of Very Thin Al2O3 Films Prepared by Magnetron Sputtering Enhanced with an Inductively Coupled rf Plasma

著录项

引文网络

相似文献

相关主题

期刊订阅