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A Study on the Metal Mesh for CuNx-Cu-CuNxMulti-layer Touch Electrode by Reactive Magnetron Sputtering

机译：反应磁控溅射CUNX-CU-CUNXMULLI层触控电极金属网的研究

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Hyun-Seok Kim; Seong-Ju Yang; Kyeong-Jae Noh; Seong-Eui Lee;
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1. DC magnetron reactive sputtered InN thin film electrodes as photoanodes in aqueous solution. A study of as prepared and nitrogen annealed electrodes [J] . Lindgren T, Torres GR, Ederth J, Thin Solid Films . 2006,第1a2期

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2. Fabrication of Porous Noble Metal Thin-Film Electrode by Reactive Magnetron Sputtering [J] . Tae-Shin Cho, Heonjin Choi, Joosun Kim Journal of nanoscience and nanotechnology . 2013,第6期

机译：磁控溅射法制备多孔贵金属薄膜电极
3. Characteristics of dc magnetron, reactively sputtered TiNx films for diffusion barriers in III–V semiconductor metallization [J] . Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films . 1984,第2期

机译：直流磁控管，III-V半导体金属化中扩散阻挡层的反应溅射TiNx膜的特性
4. Preparation of Conductive LaNiO_3 Thin Films by Using Reactive RF Magnetron Sputtering with La and Ni Metals [C] . Heesan KIM, Jai-Hyun KIM, Woong Kil CHOO Korean conference on semiconductors . 2003

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5. Texture evolution in metal nitride (aluminum nitride, titanium nitride, hafnium nitride) thin films prepared by off-normal incidence reactive magnetron sputtering . [D] . Deniz, Derya. 2008

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6. Study on Some Thermal and Electrical Properties of Basalt Fabric Modified with Metal and Ceramics as a Result of Magnetron Sputtering [O] . Pamela Miśkiewicz, Iwona Frydrych, Magdalena Tokarska, 2019

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7. Time evolution of ion fluxes incident at the substrate plane during reactive high-power impulse magnetron sputtering of groups IVb and VIb transition metals in Ar/N2 [O] . Grzegorz Greczynski, Igor Zhirkov, Ivan Petrov, 2018

机译：在AR / N2中基团IVB和VIB过渡金属的反应性高功率脉冲磁控溅射期间入射在基板平面上的离子助熔剂的时间越演变
8. Intrinsic Stress in Reactively Magnetron Sputtered Metal-Nitride/Oxide Films [R] . Pulker, H. K., Rille, S. E. 1991

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A Study on the Metal Mesh for CuNx-Cu-CuNxMulti-layer Touch Electrode by Reactive Magnetron Sputtering

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