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Analysis of Polishing Mechanism by Visco-elasticity Dynamic Behavior of Polishing Pads.

机译：抛光垫粘弹性动力学行为抛光机理分析。

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Akio CHIBA; Koji KOIZUMI; Takuhiro IWASAKI; Masayuki IKEDA;
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年度 1999
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5. Evaluation and characterization of polyurethane chemical mechanical planarization polishing pads. [D] . Achuthan, Krishnashree. 1999

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Analysis of Polishing Mechanism by Visco-elasticity Dynamic Behavior of Polishing Pads.

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