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In-situ TEM Analyses over FIB Lamellae - Investigating High Temperature Conversion of Solution Processed Mo-precursor to MoS2 Semiconductor Films.

机译：FIB LAMELLAE的原位TEM分析 - 研究溶液加工MO-前体对MOS2半导体膜的高温转化。

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Anuj Pokle; Megan Canavan; Dermot Daly; Francis Oliver Vinay Gomes; Marko Marinkovic; Veit Wagner; Valeria Nicolosi;
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1. A new way of FIB-processing Creating TEM lamellae with the new Ion-sculptor FIB column of ZEISS Crossbeam [J] . Andreas Rosenauer Elektronenmikroskopie . 2018,第44期

机译：一种新的FIB处理方式，用新的Zeiss Crossbeam的ION-Sculptor Fib柱产生TEM LAMELLAE
2. EBSD investigation of the crack initiation and TEM/FIB analyses of the microstructural changes around the cracks formed under Rolling Contact Fatigue (RCF) [J] . A. Grabulov, R. Petrov, H.W. Zandbergen International Journal of Fatigue . 2010,第3期

机译：EBSD对裂纹萌生的研究以及TEM / FIB对在滚动接触疲劳（RCF）下形成的裂纹周围的微观结构变化的分析
3. Investigation of Low Temperature Process of Solution Processed Oxide Semiconductor as a Thin Film Transistor [J] . Cheong Hea Jeong, Ogura Shintaro, Yoshida Manabu, Journal of Photopolymer Science and Technology . 2015,第3期

机译：固溶处理氧化物半导体薄膜晶体管的低温工艺研究
4. EBSD Investigation of the crack initiation and TEM/FIB analyses of the microstructural changes around the cracks formed under Rolling Contact Fatigue (RCF) [C] . A. Grabulov, R. Petrov, H. W. Zandbergen Materials science amp; technology 2008 conference and exhibition (MSamp;T'08): the leading forum addressing structure, properties, processing and performance across the materials community . 2008

机译：EBSD裂纹萌生研究，以及在滚动接触疲劳（RCF）下形成的裂纹周围的显微组织变化的TEM / FIB分析
5. Low-Temperature Solution Processing of Amorphous Metal Oxide Semiconductors for High-Performance Thin-Film Transistors. [D] . Hennek, Jonathan W. 2013

机译：用于高性能薄膜晶体管的非晶态金属氧化物半导体的低温溶液处理。
6. Low-Temperature Solution Processing of Mesoporous Metal–Sulfide Semiconductors as Light-Harvesting Photoanodes [O] . Flannan T F OMahony, Ute B Cappel, Nurlan Tokmoldin, -1

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7. In-Situ EDS Characterization of TEM Lamellae Created by Xe Plasma FIB [O] . Tomáš Hrnčíř, Christian Lang, Jozef Vincenc Oboňa, 2015

机译：原位EDS由XE等离子FIB产生的TEM Lamellae的表征

In-situ TEM Analyses over FIB Lamellae - Investigating High Temperature Conversion of Solution Processed Mo-precursor to MoS2 Semiconductor Films.

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