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Effect of defects on lifetime of silicon electrodes and rings in plasma etcher

机译：缺陷对等离子体蚀刻器中硅电极寿命的效果

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Jung-Hyun Eum; Jung-Min Chae; Jae-Hwan Pee; Sung-Min Lee; Kyoon Choi; Sang-Jin Kim; Tae-Sik Hong; Choong-Ho Hwang; Hak-Joon Ahn;
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1. Etch Defect Reduction Using SF_6/O_2 Plasma Cleaning and Optimizing Etching Recipe in Photo Resist Masked Gate Poly Silicon Etch Process [J] . Seong Yeol MUN, Kyeong Cheol SHIN, Sung Soo LEE, Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers . 2005,第7A期

机译：使用SF_6 / O_2等离子清洁技术减少蚀刻缺陷并优化光刻胶掩膜栅多晶硅蚀刻工艺中的蚀刻配方
2. Chlorine plasma and polysilicon etch characterization in an inductively coupled plasma etch reactor [J] . Khater MH, Overzet LJ Plasma Sources Science & Technology . 2004,第3期

机译：电感耦合等离子体蚀刻反应器中氯等离子体和多晶硅蚀刻的表征
3. Influence of reactor walls on plasma chemistry and on silicon etch product densities during silicon etching in halogen-based plasmas [J] . Cunge G, Kogelsehatz M, Sadeghi N Plasma Sources Science & Technology . 2004,第3期

机译：在卤素基等离子体中进行硅刻蚀时，反应器壁对等离子体化学性质和硅刻蚀产物密度的影响
4. Microcontamination control in a Lam 4400 plasma etcher: 15X reduction in particle defect densities during SF6/He silicon trench etch [C] . Shantanu Bhagvat, Silicon Systems, Inc., Process, Equipment, and Materials Control in Integrated Circuit Manufacturing III . 1997

机译：Lam 4400等离子蚀刻机中的微污染控制：在SF6 / He硅沟槽蚀刻过程中，颗粒缺陷密度降低了15倍
5. Silicon oxide and silicon nitride etch mechanisms in nitrogen trifluoride/ethylene plasma. [D] . Machima, Puthajat. 2005

机译：三氟化氮/乙烯等离子体中的氧化硅和氮化硅蚀刻机理。
6. Investigation of hydrogen plasma treatment for reducing defects in silicon quantum dot superlattice structure with amorphous silicon carbide matrix [O] . Shigeru Yamada, Yasuyoshi Kurokawa, Shinsuke Miyajima, 2014

机译：氢等离子体处理非晶碳化硅基体减少硅量子点超晶格结构缺陷的研究
7. The Development of Deep Silicon Etch Process with Conventional Inductively Coupled Plasma (ICP) Etcher [O] . 2004

机译：具有传统电感耦合等离子体（ICP）蚀刻器的深硅蚀刻工艺的开发
8. Optical diagnostic instrument for monitoring etch uniformity during plasma etching of polysilicon in a chlorine-helium plasma. [R] . Hareland, W. A., Buss, R. J. 1993

机译：用于监测氯 - 氦等离子体中多晶硅的等离子体蚀刻期间的蚀刻均匀性的光学诊断仪器。

Effect of defects on lifetime of silicon electrodes and rings in plasma etcher

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