首页> 外文OA文献 >A study of nickel and cobalt silicides formed in the Ni/Co/Si(1 0 0) system by thermal annealing

【2h】

A study of nickel and cobalt silicides formed in the Ni/Co/Si(1 0 0) system by thermal annealing

机译：通过热退火在Ni / Co / Si（1 0 0）系统中形成的镍和钴硅化物的研究

代理获取

本网站仅为用户提供外文OA文献查询和代理获取服务，本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文，但由于OA文献来源多样且变更频繁，仍可能出现获取不到、文献不完整或与标题不符等情况，如果获取不到我们将提供退款服务。请知悉。

页面导航

著录项
引文网络
相似文献
相关主题

著录项

作者
C. Sedrati; A. Bouabellou; A. Kabir; R. Haddad; M. Boudissa; A. Taabouche; H. Fiad; A. Hammoudi;
展开▼
作者单位

展开▼
年度 2020
总页数
原文格式 PDF
正文语种
中图分类

相似文献

外文文献
中文文献
专利

1. Properties of nickel-cobalt composite silicides by thermal annealing of Ni1?xCox (x=0.2, 0.5, and 0.8) alloy thin films on silicon and polysilicon substrates [J] . Sangyeob Kim, Ohsung Song Metals and Materials International . 2007,第3期

机译：在硅和多晶硅衬底上通过Ni1？x Cox （x = 0.2、0.5和0.8）合金薄膜的热退火对镍钴复合硅化物的性能
2. Properties of Nickel-Cobalt Composite Silicides by Thermal Annealing of Ni_(1-x)Co_x(x = 0.2, 0.5, and 0.8) Alloy Thin Films on Silicon and Polysilicon Substrates [J] . Sangyeob Kim, Ohsung Song Metals and Materials International . 2007,第3期

机译：硅和多晶硅衬底上Ni_（1-x）Co_x（x = 0.2、0.5和0.8）合金薄膜的热退火对镍钴复合硅化物的性能
3. Property of Cobalt Nickel Silicide by Thermal Annealing of Co/Ni Bilayer on a Silicon Substrate [J] . Seonghwee Cheong, Ohsung Song, Min-Sung Kim Metals and Materials International . 2006,第2期

机译：硅衬底上Co / Ni双层热退火对硅化钴镍的影响
4. CARBON OUTDIFFUSION FROM Ni(C)/Pt/Si STRUCTURES DURING NICKEL SILICIDE FORMATION BY RAPID THERMAL ANNEALING [C] . Ronaldo W. Reis, Sebastiao G. dos Santos Filho, Ioshiaki Doi, International Symposium on Microelectronics Technology and Devices . 2006

机译：通过快速热退火在镍硅化镍中的Ni（C）/ Pt / Si结构的碳辐射
5. ISOTHERMAL TRANSFORMATION STUDIES ON THE EFFECTS OF ALLOYING ELEMENTS (MOLYBDENUM, NICKEL, CHROMIUM, MANGANESE, ALUMINUM, SILICON, COBALT) ON THE KINETICS OF THE AUSTENITE TO BAINITE TRANSFORMATION. [D] . LLOPIS DE YNDURAIN, ANA MARIA. 1977

机译：合金元素（钼，镍，铬，锰，铝，硅，钴）对奥氏体向贝氏体转变动力学的等温转变研究。
6. Supercapacitor Performance of Nickel-Cobalt Sulfide Nanotubes Decorated Using Ni Co-Layered Double Hydroxide Nanosheets Grown in Situ on Ni Foam [O] . Chen Xin, Li Ang, Farayi Musharavati, 2020

机译：使用在镍泡沫上原位生长的镍共沉积双氢氧化物纳米片装饰的镍钴硫化物纳米管的超级电容器性能
7. Structural and electrical characterization of the nickel silicide films formed at 850 °C by rapid thermal annealing of the Ni/Si(1 0 0) films [O] . Utlu, G., Artunç, N., Budak, S., 2010

机译：通过快速热退火Ni / Si（1 0 0）薄膜在850°C形成的硅化镍薄膜的结构和电特性
8. Selective Tungsten Silicide Formation by Ion-Beam Mixing and Rapid Thermal Annealing [R] . Tsaur, B. Y., Chen, C. K., Anderson, C. H., 1985

机译：通过离子束混合和快速热退火形成选择性钨硅化物

A study of nickel and cobalt silicides formed in the Ni/Co/Si(1 0 0) system by thermal annealing

著录项

引文网络

相似文献

相关主题

期刊订阅