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Surface properties of metal‐nitride and metal‐carbide films deposited on Nb for radio‐frequency superconductivity

机译：基于Nb的金属 - 氮化物和金属碳化物膜的表面性质，用于射频超导

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E. L. Garwin; F. K. King; R. E. Kirby; O. Aita;
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年度 1987
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1. Metal–Semiconductor–Metal Ultraviolet Photodetectors Based on Films Deposited by Radio-Frequency Magnetron Sputtering [J] . Electron Device Letters, IEEE . 2010,第6期

机译：基于射频磁控溅射沉积薄膜的金属-半导体-金属紫外光电探测器
2. Composition dependent microstructure and optical properties of boron carbide (B_xC) thin films deposited by radio frequency-plasma enhanced chemical vapour deposition technique [J] . Bute A., Jena S., Bhattacharya D., Materials Research Bulletin . 2019,第JANa期

机译：射频等离子体增强化学气相沉积技术沉积的碳化硼（B_xC）薄膜的成分依赖性微观结构和光学性质
3. Effect of substrate temperature and radio frequency power on compositional, structural and optical properties of amorphous germanium carbide films deposited using sputtering [J] . Gupta Neeti, Veettill Binesh Puthen, Conibeer Gavin, Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites . 2016,第Null期

机译：基板温度和射频功率对通过溅射沉积的非晶碳化锗膜的成分，结构和光学性质的影响
4. PROPERTIES OF METALORGANIC CHEMICAL VAPOR DEPOSITED TANTALUM NITRIDE THIN FILMS [C] . S.C. SUN, M.H. TSAI, C. E. TSAI, International conference on solid-state and integrated-circuit technology; 19951024-28; Beijing(CN) . 1995

机译：金属化学气相沉积氮化钽薄膜的性能
5. Metal-nitride thin films deposited by unbalanced magnetron sputtering [D] . Rohde, Suzanne Louise 1991

机译：通过不平衡磁控溅射沉积的金属氮化物薄膜
6. Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Films [O] . Mateusz Œmietana, Robert Mroczyński, Norbert Kwietniewski 2014

机译：射频等离子体增强化学气相沉积（RF PECVD）反应器中样品高度对氮化硅薄膜光学性能和沉积速率的影响
7. Effect of Substrate Bias Voltage on the Properties of Hafnium Nitride Films Deposited by Radio Frequency Magnetron Sputtering Assisted by Inductive Coupled Nitrogen Plasma [O] . Sung-Bo Heo, Hak-Min Lee, Dae-Il Kim, 2011

机译：基板偏置电压对射频磁控溅射沉积的氮化铪膜性能的影响通过电感耦合氮等离子体辅助辅助
8. Surface Properties of Metal-Nitride and Metal-Carbide Films Deposited on Nb for RF Superconductivity [R] . Garwin, E. L., King, F. K., Kirby, R. E., 1983

机译：Nb上金属氮化物和金属碳化物薄膜的表面特性研究射频超导电性

Surface properties of metal‐nitride and metal‐carbide films deposited on Nb for radio‐frequency superconductivity

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