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Characterization of nanoscaled films on flat and grating substrates as some elements of plasmonics

机译:在平面和光栅基板上将纳米级薄膜表征为等离激元的某些元素

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摘要

The optical properties of multilayer structures consisting of dielectric,udconductivity-oxide and nanoscaled metal layers, deposited on the planar substratesud(witness samples) and surface relief ones (diffraction gratings) with micro- and nanoscaleudsizes, are investigated by AFM, spectral ellipsometry (SE), and photometric techniques.udThe SE-measured parameters are related to actual characteristics of the layers whenudspecified the model of their near-surface regions. Using a parametrization of the layeruddielectric function versus the wavelength and a fitting procedure, the dielectricudparameters are determined. It is shown that the optical constants are affected by both theudsubstrate morphology and the adjacent medium. Preliminary data about the influence ofudisolated particle plasmon excitations in 2D-substrates with the top nanoscaled Au layerudon its optical properties are presented.
机译:通过原子力显微镜研究了由介电,超导氧化物和纳米级金属层组成的多层结构的光学性质,该多层结构沉积在具有微米级和纳米级尺寸的平面基板 ud(见证样品)和表面起伏结构(衍射光栅)上。 ,光谱椭圆偏振法(SE)和光度学技术。 ud当指定了其近表面区域模型时,SE测得的参数与层的实际特征有关。使用层介电函数对波长的参数化和拟合过程,确定介电 ud参数。结果表明,光学常数同时受基底形态和邻近介质的影响。给出了有关具有顶部纳米级Au层的2D衬底中孤立粒子等离子体激元激发的影响其光学性质的初步数据。

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