Characterisation of Mo–V–N Coatings Deposited on XC100 Substrate by Sputtering Cathodic Magnetron

摘要

The aim of this work is the characterization of ternary molybdenum–vana¬dium nitride (Mo–V–N) coatings deposited on silicon and XC100 steel substrates by the reactive radiofrequency dual magnetron sputtering with different contents of the Mo and V targets and nitrogen as reactive gas. The metal-target bias voltages are varied from 300 to 900 V. The hardness, surface morphology, microstructure and composition are studied by nanoindentation, scanning electron microscopy, atomic-force microscopy, and x-ray diffractometry. The Mo–V–N films manifest pyramidal surface morphology, high roughness (of 13.5 nm), but low mechanical properties. Hardness and Young’s modulus are found in the ranges of 10–18 GPa and 100–335 GPa, respectively. The residual stresses of coatings are compressive and varied between 0.8 GPa and 2.5 GPa (calculated with the Stoney formula).