Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques

摘要

The envelope method was used to determine optical constants of TiO₂ thinudfilms deposited by DC reactive magnetron sputtering and electron-beam evaporationudtechniques. The density and thickness of the thin films were calculated. Opticaludproperties of the TiO₂ thin films were strongly dependent on the deposition technology.udThe TiO₂ thin films prepared by magnetron sputtering and electron-beam evaporationudmethods were established to be indirect band semiconductors with the band gap energiesud3.15 and 3.43 eV, respectively.