We use a highly localised resistive heating technique to grow vertically aligned multiwalled nanotubeudfilms and aligned single-walled nanotubes on substrates with an average temperature of less than 100°C. Theudtemperature at the catalyst can easily be as high as 1000 °C but an extremely high temperature gradientudensures that the surrounding chip is held at much lower temperatures, even as close as 1μm away from theudlocal heater. We demonstrate the influence of temperature on the height of multi-walled nanotube films,udillustrate the feasibility of sequential growth of single-walled nanotubes by switching between local heatersudand also show that nanotubes can be grown over temperature sensitive materials such as resist polymer.
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