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Stimulated emission of Cr²⁺ ions in ZnS:Cr thin-film electroluminescent structures

机译:ZnS:Cr薄膜电致发光结构中Cr 2+离子的受激发射

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摘要

First observation of stimulated Cr²⁺ emission in ZnS:Cr electroluminescentud(EL) impact-excited thin-film waveguide structures is reported. The structures consist ofudthe following thin films deposited on a glass substrate: a transparent In₂O₃:Sn electrode,udan insulator SiO₂/Al₂O₃ layer (~270 nm), an EL ZnS:Cr film (~600 nm), the sameudinsulator layer, and an Al electrode. The stimulated character of the emission recordedudthrough the edge of the structure is evidenced by the following. With increasing theudapplied voltage, a broad band with three waveguide mode maxima in the edge emissionudspectrum changes into an intensifying and narrowing band. The maximum of this band isudthe same as that of the Cr²⁺ emission band recorded through the face, i.e. through theudIn₂O₃:Sn electrode (1.75 and ~2.6 µm at the Cr concentrations (5-7)*10¹⁹ and (2-ud3)*10²⁰ cm⁻³, respectively). The five-fold narrowing is observed when increasing theudvoltage by ~4% in the case of the lower Cr concentration. The voltage and frequencyuddependences of the edge emission are stronger than those for the face emission. A smalludmanifestation of the gain occurrence in the ZnS:Cr TFELS is also observed in the faceudemission. The possibility to create a new type of electrically pumped lasers with theudimpact excitation mechanism is discussed.
机译:首次观察到了在ZnS:Cr电致发光 ud(EL)冲击激发薄膜波导结构中激发Cr 2+发射的现象。该结构由以下薄膜组成:沉积在玻璃基板上的以下薄膜:透明的In 2 O 3:Sn电极,udan绝缘体SiO 2 / Al 2 O 3层(约270 nm),EL ZnS:Cr膜(约600 nm),相同的绝缘层和铝电极。通过结构边缘记录/发射的受激特征由以下证明。随着施加电压的增加,边缘发射光谱中具有三个波导模式最大值的宽带变为增强带和窄带。该谱带的最大值与通​​过面部记录的Cr 2+发射谱带的最大值相同,即通过 udIn 2 O 3:Sn电极(在Cr浓度(5-7)* 10 15和(2时为1.75和〜2.6 µm)) - ud3)*10²⁰cm⁻³)。在较低的Cr浓度下,当将过电压增加〜4%时,观察到五倍变窄。边缘发射的电压和频率依赖性比面部发射的强。在面部发射中也观察到了ZnS:Cr TFELS中增益发生的小变化。讨论了创建具有 udimpact激发机制的新型电泵浦激光器的可能性。

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