首页> 外文OA文献 >Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate
【2h】

Influence of ion implantation on the near-surface structure of thin Ni and Pd films on lithium niobate and lithium tantalate

机译:离子注入对铌酸锂和钽酸锂上Ni和Pd薄膜近表面结构的影响

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

The systems “thin Ni film – lithium niobate” and “thin Pd film – lithiumudtantalate” are implanted by Ar⁺ ions with an energy of 100 keV and a dose of 10¹⁶ cm⁻².udAnalyses of the systems by AFM and SEM have shown that the ion implantationudessentially modifies the near-surface structure resulting in a change of its optical,udelectrical, and mechanical properties. Strong difference in the near-surface structuresudbetween implanted systems with Ni or Pd thin films is observed. Such a difference isudexplained by the heterogeneity of an ion beam and different properties of the materials.udThe application to the development of high-sensitive pyroelectric detectors with highuddamage threshold is proposed.
机译:系统是通过ArV离子注入能量为100 keV,剂量为10⁶cm²²的系统“ Ni薄膜-铌酸锂”和“ Pd薄膜-钽酸锂”。 ud通过AFM和SEM分析系统已经表明,离子注入在本质上修饰了近表面结构,从而改变了其光学,电子和机械性能。观察到具有Ni或Pd薄膜的注入系统之间的近表面结构之间的强烈差异。通过离子束的异质性和材料的不同特性来解释这种差异。 ud提出了具有高损耗阈值的高灵敏度热释电探测器的开发应用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号