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Influence of external magnetic field on intensity and directivity of EUV radiation from high-current pulse plasma diode

机译:外部磁场对大电流脉冲等离子体二极管EUV辐射强度和方向性的影响

摘要

This work is devoted to evaluate the influence of the additional external magnetic field on dynamics of the radiation in the extreme ultraviolet (EUV) range from multi-charged tin plasma of high-current pulse diode. Investigations have shown that the use of an additional external magnetic field has improved the stability of the plasma diode, enhanced the intensity of radiation, and changed the radiation profile.
机译:这项工作致力于评估额外的外部磁场对来自大电流脉冲二极管的多电荷锡等离子体的极紫外(EUV)范围内辐射动力学的影响。研究表明,使用附加的外部磁场可以改善等离子体二极管的稳定性,增强辐射强度并改变辐射轮廓。

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