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Simulation of radiation characteristics of pulse X-ray devices for non-destructive testing the semiconductor materials

机译:用于无损检测半导体材料的脉冲X射线设备辐射特性的仿真

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摘要

In the work, non-destructive testing the Si and Ge semiconductors by pulse X-ray sources is discussed. Mathematical simulation of the radiation generation in reflection and transmission anode tubes is performed. Details of energy spectrum formation in these pulse tubes are analyzed, and its transformation when passing through thin samples of semiconductor materials is discussed. The dependence of the amount of radiation absorbed by the samples on the amplitude of acceleration voltage is calculated. It is shown how the pulse operation regime and design features of pulse tubes influence the characteristics of the X-ray radiation.
机译:在工作中,讨论了通过脉冲X射线源对Si和Ge半导体进行无损检测的方法。对反射和透射阳极管中产生的辐射进行数学模拟。分析了这些脉冲管中能谱的形成细节,并讨论了通过薄薄的半导体材料样品时的能谱变换。计算样品吸收的辐射量与加速电压幅度的关系。示出了脉冲操作方式和脉冲管的设计特征如何影响X射线辐射的特性。

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