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Comparison of electron transport in polar materials for the models of low-density and high-density electron gas. Application to bulk GaN

机译:低密度和高密度电子气模型中极性材料中电子传输的比较。应用于块状GaN

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摘要

We analyzed the steady-state electron transport for bulk GaN in frame of twoud opposite approaches: the electron temperature approach that assumes a high-densityud electron gas and numerical single-particle Monte-Carlo method that assumes a lowdensityud electron gas and does not take into account electron-electron (e-e) scattering. Weud have also presented an analytical solution of the Boltzmann transport equation based onud diffusion approximation. The transport characteristics such as the drift velocity electricud field, V d (E), and mean electron energy electric field, ε(E), have been calculated atud nitrogen and room temperatures in the wide range of applied electric fields from zeroud fields up to runaway ones (~100 kV/cm) for both approaches. Our calculations wereud performed for doped semiconductor with equal impurity and electron concentrations,ud Ni = n =10¹⁶ cm⁻³. The electron distribution functions in various ranges of appliedud fields have been also demonstrated. Within the range of heating applied fields 0–ud 300 V/cm, we found a strong difference between the transport characteristics obtained byud means of the balance equations (electron temperature approach) and Monte-Carloud procedure. However, the Monte-Carlo calculations and diffusion approximation show aud good agreement at 77 K. Within the range of moderate fields 1–10 kV/cm at 77 K, weud established that the streaming effect can occur for low-density electron gas. In spite ofud significant dissimilarity of a streaming-like and a shifted Maxwellian distributionud functions, the calculated values of Vd(E) and ε(E) show similar sub-linear behaviorud as the functions of the applied field E. In the high-field range 20–80 kV/cm, theud streaming effect is broken down, and we observe practically linear behavior of bothud Vd(E) and ε(E) for both approaches. At higher fields, we point out the initiation ofud the runaway effect.
机译:我们在两种相反的方法框架内分析了块状GaN的稳态电子传输:假设电子温度方法假定为高密度 ud电子气,而数值单粒子蒙特卡罗方法假定为低密度 ud电子气体,并且不考虑电子-电子(ee)散射。我们还提供了基于ud扩散近似的Boltzmann输运方程的解析解。在很宽的应用电场范围内,在氮气和室温下,计算了诸如漂移速度电场 ud电场V d(E)和平均电子能电场ε(E)的传输特性,两种方法的零场/ ud场直至失控场(〜100 kV / cm)。我们的计算是对具有相同杂质和电子浓度的掺杂半导体进行的,ud Ni = n = 10 11 cm -3。还已经证明了在各种应用 ud场中的电子分布函数。在加热场0-ud 300 V / cm的范围内,我们发现通过平衡方程(电子温度法)和蒙特卡洛程序得到的输运特性之间存在很大差异。但是,蒙特卡洛计算和扩散近似显示在77 K处有很好的一致性。在77 K的1-10 kV / cm的中等磁场范围内,我们确定低密度时会发生流效应电子气。尽管 ud函数和移位的Maxwellian分布函数具有明显的差异 ud,但计算出的Vd(E)和ε(E)的值仍表现出与应用场E函数相似的亚线性行为 ud在20-80 kV / cm的高场范围内, ud流效应被破坏,我们观察到两种方法的ud Vd(E)和ε(E)都具有线性行为。在更高的领域,我们指出了逃逸效应的开始。

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