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Experimental studies of the recombination processes in II-VI semiconductors (bulk crystals and epilayers) at variable excitation levels

机译:II-VI半导体(体晶体和外延层)在不同激发水平下重组过程的实验研究

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摘要

Low-temperature luminescence spectra under broad-scale variation of anudexcitation level Iexc are studied for ZnS/ZnSe single quantum wells (QW)udand for CdS bulk crystals and epilayers. In the first case, the manifestationsudturn out to be of the heterointerface inhomogeneity - i.e. fluctuations of QWudthickness. The position of the mobility edge for excitons localized by fluctuations is determined. In the second case the effect of the increase of Iexcudis systematically studied not only for excitonic but also for impurity-relatedudedge luminescence. Contrary to the earlier and commonly assumed expectations, up to the highest Iexc close to damage threshold no saturation ofudedge luminescence intensity was observed in bulk CdS crystals, whereasudin a few thick epilayers such saturation did occur. The suggested qualitativeudexplanation takes into account diffusion (non-diffusive transport) of carriersudbeyond the excited near-surface layer.
机译:研究了ZnS / ZnSe单量子阱(QW) ud和CdS块状晶体和外延层在宽泛的反激水平Iexc变化下的低温发光光谱。在第一种情况下,这些结果证明是异质界面不均匀的,即,QW的波动厚度。确定了受波动影响的激子的迁移边缘的位置。在第二种情况下,系统地研究了Iexc udis的增加的影响,不仅对激子,而且还对与杂质有关的/边缘发光进行了研究。与更早的和通常的预期相反,在接近损伤阈值的最高Iexc中,在块状CdS晶体中未观察到 udedge发光强度的饱和,而 udin在一些厚的外延层中确实发生了这种饱和。建议的定性解释说明考虑了超出受激近表面层的载流子的扩散(非扩散传输)。

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