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Pulsed Laser Deposition of Thin Iron and Chromium Silicide Films with Large Thermoelectromotive Force Coefficient

机译：热电动势系数大的硅化铁和铬化硅薄膜的脉冲激光沉积

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Nanostructures in the form of thin films exhibiting the semiconductor properties with a narrow energy-band gap are deposited from the CrSi₂ and β-FeSi₂ targets by means of the pulsed laser deposition (PLD) assisted with an excimer KrF laser.

机译：借助于准分子KrF激光器辅助的脉冲激光沉积（PLD），从CrSi 2和β-FeSi2靶沉积具有窄的能带隙的具有半导体性能的薄膜形式的纳米结构。

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Mulenko S.A.;
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专利

1. Deposition of chromium, oxide thin films with large thermoelectromotive force coefficient by reactive pulsed laser ablation [J] . A. P. CARICATO, A. LUCHES, M. MARTINO, Journal of optoelectronics and advanced materials . 2010,第3期

机译：反应性脉冲激光烧蚀沉积具有大热电动势系数的铬氧化物薄膜
2. Deposition Of Thin Films For Sensors By Pulsed Laser Ablation Of Iron And Chromium Silicide Targets [J] . A.P. Caricato, A. Luches, F. Romano, Applied Surface Science . 2007,第4期

机译：铁和铬硅化靶的脉冲激光烧蚀沉积传感器薄膜
3. Pulsed laser-ablation deposition of thin films of molybdenum silicide and its properties as a conducting barrier for ferroelectric random-access memory technology [J] . Suchedta Madhukar, S. Aggarwal, A. M. Dhote Journal of Materials Research . 1999,第3期

机译：脉冲激光烧蚀沉积硅化钼薄膜及其作为铁电随机存取存储技术的导电阻挡层的特性
4. SYNTHESIS OF NANOMETRIC IRON AND CHROMIUM OXIDE FILMS BY REACTIVE PULSED LASER DEPOSITION FOR PHOTO-THERMO SENSORS [C] . S.A.Mulenko Conference on Fundamentals of laser-assisted micro- and nanotechnologies . 2011

机译：光电脉冲传感器的脉冲激光沉积法合成纳米铁和氧化铬膜
5. Materials physics of half-metallic magnetic oxide films by pulsed laser deposition: Controlling the crystal structure and near-surface properties of strontium iron molybdenum oxide and chromium oxide films. [D] . Jalili, Helia. 2009

机译：通过脉冲激光沉积制备半金属磁性氧化物薄膜的材料物理学：控制锶铁钼氧化物和铬氧化物薄膜的晶体结构和近表面性质。
6. Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films [O] . Daiki Katsube, Hayato Yamashita, Satoshi Abo, 2018

机译：脉冲激光沉积与非接触原子力显微镜相结合的系统用于绝缘子金属氧化物薄膜的研究
7. Ecologically Friendly Metal-Silicide Semiconductor Reserch. Film Structure of .BETA.-FeSi2 Thin Films Prepared by Pulsed Laser Deposition Using an FeSi2 Alloy Target. [O] . Tsuyoshi YOSHITAKE, Tatsuya NAGAMOTO, Gousuke SHIRAISHI, 2000

机译：生态友好友好的金属 - 硅化物半导体固定。用Fesi2合金靶通过脉冲激光沉积制备的.Beta.-Fesi2薄膜的薄膜结构。
8. Pulsed Laser Deposition of Thin Films for Lasers and Quasi-Phase Matched Devices. [R] . R. W. Eason 2013

机译：用于激光器和准相位匹配器件的薄膜脉冲激光沉积。

Pulsed Laser Deposition of Thin Iron and Chromium Silicide Films with Large Thermoelectromotive Force Coefficient

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