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Incorporating Niobium in MoS 2 at BEOL‐Compatible Temperatures and its Impact on Copper Diffusion Barrier Performance

机译：在BEOL兼容温度下掺入MOS 2的铌及其对铜扩散屏障性能的影响

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Rui Zhao; Chun‐Li Lo; Fu Zhang; Ram Krishna Ghosh; Theresia Knobloch; Mauricio Terrones; Zhihong Chen; Joshua Robinson;
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1. Incorporating Niobium in MoS2 at BEOL-Compatible Temperatures and its Impact on Copper Diffusion Barrier Performance [J] . Zhao Rui, Lo Chun-Li, Zhang Fu, Advanced materials interfaces . 2019,第22期

机译：在BEOL兼容温度下掺入MOS2中的铌及其对铜扩散阻挡性能的影响
2. Barrier Integrity of Electroless Diffusion Barriers and Organosilane Monolayer against Copper Diffusion under Bias Temperature Stress [J] . Akiyoshi Mitsumori, Shota Fujishima, Kazuyoshi Ueno Japanese journal of applied physics . 2012,第5Issue2期

机译：偏压温度应力下化学扩散阻挡层和有机硅烷单层对铜扩散的阻挡层完整性
3. Diffusion barrier performance of nano-structured and amorphous Ru-Ge diffusion barriers for copper metallization [J] . He G., Yao L., Song Z., Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2012,第7期

机译：纳米结构和非晶态Ru-Ge扩散阻挡层对铜金属化的扩散阻挡性能
4. An investigation into the performance of diffusion barrier materials against copper diffusion using metal-oxide-semiconductor (MOS) capacitor structures [C] . Vee S. C. Len, R. E. Hurley, N. McCusker, Symposium on Materials and Processes for Submicron Technologies Conferecne . 1997

机译：使用金属氧化物半导体（MOS）电容器结构对铜扩散扩散阻挡材料性能的研究
5. Molybdenum silicide diffusion barrier for the passivation of copper at elevated temperatures. [D] . Cvitkovic, Robert. 1994

机译：硅化钼扩散阻挡层，用于在高温下钝化铜。
6. Corrigendum: Active layers of high-performance lead zirconate titanate at temperatures compatible with silicon nano- and microelectronic devices [O] . Iñigo Bretos, Ricardo Jiménez, Monika Tomczyk, -1

机译：勘误：在与硅纳米和微电子器件兼容的温度下高性能锆钛酸铅钛酸盐的活性层
7. The Influence of Niobium and Niobium-Titanium Grain Size on the Drawing Instability of Niobium Diffusion Barriers in Niobium-Titanium Wire [O] . R. W. Heussner, P. J. Lee, P. D. Jablonski, 1994

机译：铌和铌钛晶粒尺寸对铌钛线铌扩散阻挡层拉拔不稳定性的影响

Incorporating Niobium in MoS 2 at BEOL‐Compatible Temperatures and its Impact on Copper Diffusion Barrier Performance

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