The results of technological tests of longitudinal planar magnetron sputtering system (MSS) with a magnetically isolated anode working in pulse-modes with additional pulse heavy-current high-voltage supply source are presented. It is shown that efficiency of mass transfer in the pulse mode overcoating increases by three orders of magnitude as compared to stationary mode of magnetron discharge. Hereat there is no droplet phase at the copper coating that is typical for an arc evaporation of a cathode.
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