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Development and application of metal contacts on polycrystalline diamond films using combination of HF and arc plasma sources

机译:HF和电弧等离子源的结合在多晶金刚石薄膜上的金属触点的开发和应用

摘要

In this paper, the technology of application of ohmic contacts using arc discharge assisted by HF field was developed for semiconductor radiation detectors production. Polycrystalline diamond material for production of detectors was synthesized by chemical vapor deposition method (CVD) in NSC KIPT. Bilayer contacts were deposited on polycrystalline CVD (pCVD) diamond films, where the first layer was chromium, and the second layer – copper or stainless steel respectively. Electro-physical characteristics of pCVD diamond detectors with different contact materials were studied.
机译:本文研究了利用HF场辅助电弧放电的欧姆接触技术,用于半导体辐射探测器的生产。在NSC KIPT中通过化学气相沉积法(CVD)合成了用于生产探测器的多晶金刚石材料。双层触点沉积在多晶CVD(pCVD)金刚石薄膜上,第一层是铬,第二层分别是铜或不锈钢。研究了具有不同接触材料的pCVD金刚石探测器的电物理特性。

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