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Structure and Electrochemical Properties of Nitrogen Doped Diamond-like Carbon Film Synthesized by Low Temperature Neutral Beam Enhanced Chemical Vapor Deposition

机译：低温中性光束合成的氮掺杂金刚石状碳膜的结构和电化学性能增强化学气相沉积

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Qiuhe Wang;
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1. Structure and Electrochemical Properties of Nitrogen Doped Diamond-like Carbon Film Synthesized by Low Temperature Neutral Beam Enhanced Chemical Vapor Deposition [J] . Qiuhe Wang, Xijiang Chang, Yoshiyuki Kikuchi, International Journal of Electrochemical Science . 2018,第2期

机译：低温中性光束合成的氮掺杂金刚石状碳膜的结构和电化学性能增强化学气相沉积
2. Effects of silicon doping on the chemical bonding states and properties of nitrogen-doped diamond-like carbon films by plasma-enhanced chemical vapor deposition [J] . Nakamura K., Ohashi H., Enta Y., Thin Solid Films . 2021,第Octa31期

机译：硅掺杂对等离子体增强化学气相沉积的氮掺杂金刚石状碳膜化学粘合状态及性质
3. The electrochemical properties of LaNi5 electrodes doped with multi-walled carbon nanotubes synthesized by chemical vapor deposition and treated at different temperatures in a nitrogen atmosphere [J] . Yi SP, Zhang HY, Zhang GQ, Physica, B. Condensed Matter . 2006,第1期

机译：掺杂多壁碳纳米管的LaNi5电极的化学性能，通过化学气相沉积法合成并在氮气氛中在不同温度下处理
4. Substrate Effect on the Diamond-Like Carbon Films Synthesized by RF Plasma Enhanced Chemical Vapor Deposition [C] . S.-S. Tzeng, W.-M. Wu, J.-S. Hsu International Conference on Processing amp; Manufacturing of Advanced Materials; 20060704-08; Vancouver(CA) . 2006

机译：射频等离子体增强化学气相沉积合成的类金刚石膜上的基体效应
5. Investigation of the structure and properties of diamond-like carbon films deposited electrochemically at low temperatures. [D] . Pingsuthiwong, Charoendee. 2004

机译：研究在低温下电化学沉积的类金刚石碳膜的结构和性能。
6. Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature [O] . Noor Hamizah Khanis, Richard Ritikos, Shafarina Azlinda Ahmad Kamal, 2017

机译：N2：（N2 + CH4）比在低温等离子体增强化学气相沉积法生长疏水纳米结构氢化氮化碳薄膜中的作用研究
7. Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature [O] . Noor Hamizah Khanis, Richard Ritikos, Shafarina Azlinda Ahmad Kamal, 2017

机译：N2：（N2 + CH4）比对低温等离子体增强化学气相沉积法制备疏水纳米结构氢化碳氮化物薄膜的研究
8. Effect of the Evaporation Temperature of a Tetraphenyl- Tetramethyl- Trisiloxane (Dow-Corning 704) Precursor on the Properties of Silicon Containing Diamond-Like Carbon (Si-DLC) Coatings Synthesized by Ion-Beam-Assisted Deposition (IBAD) [R] . Fountzoulas, C. G. , Hirvonen, J. K. , Clayton, C. W. , 1999

机译：四苯基 - 四甲基 - 三硅氧烷（Dow-Corning 704）前驱体蒸发温度对离子束辅助沉积（IBaD）合成的含硅类金刚石碳（si-DLC）涂层性能的影响

Structure and Electrochemical Properties of Nitrogen Doped Diamond-like Carbon Film Synthesized by Low Temperature Neutral Beam Enhanced Chemical Vapor Deposition

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