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Printability of native blank defects and programmed defects and their stack structures

机译：本机空白缺陷和编程缺陷的可打印性及其堆栈结构

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Hyuk Joo Kwon; Jenah Harris-Jones; Ranganath Teki; Aaron Cordes; Toshio Nakajima; Iacopo Mochi; Kenneth A. Goldberg; Yuya Yamaguchi; Hiroo Kinoshita;
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年度 2011
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1. Study on Critical Dimension of Printable Phase Defects Using an Extreme Ultraviolet Microscope: II. Definition of Printable Threshold Region for Hole-Pit Programmed Defects [J] . Yoshito Kamaji, Toshiyuki Uno, Kei Takase, Japanese journal of applied physics.Part 1.Regular papers & short notes . 2010,第12期

机译：使用极紫外显微镜研究可印刷相缺陷的临界尺寸：II。孔坑缺陷的可打印阈值区域的定义
2. Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks [J] . Ted Liang, Erdem Ultanir, Guojing Zhang, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2007,第6期

机译：极紫外掩模空白板上多层相缺陷的生长和可印刷性
3. Printability of nonsmoothed buried defects in extreme ultraviolet lithography mask blanks [J] . Vincent Farys, Christelle Charpin-Nicolle, Marieke Richard, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2005,第6期

机译：极紫外光刻掩模坯料中非光滑掩埋缺陷的可印刷性
4. Printability of Native Blank Defects and Programmed Defects and Their Stack Structures [C] . Hyuk Joo Kwon, Jenah Harris-Jones, Ranganath Teki, Conference on photomask technology . 2012

机译：原始空白缺陷和程序化缺陷及其堆栈结构的可打印性
5. Native defect enhanced interdiffusion in aluminum gallium arsenide quantum well heterostructures. [D] . Seshadri, Suresh. 1994

机译：天然缺陷增强了砷化铝镓量子阱异质结构中的相互扩散。
6. Native Point Defect Measurement and Manipulation in ZnO Nanostructures [O] . Leonard Brillson, Jonathan Cox, Hantian Gao, 2019

机译：ZnO纳米结构中的本征点缺陷测量和处理
7. Detectability and printability of EUVL mask blank defects for the 32-nm HP node [O] . Wonil Cho, Hak-Seung Han, Kenneth A. Goldberg, 2007

机译：EUVL掩模空白缺陷对32-NM HP节点的可检测性和可打印性

Printability of native blank defects and programmed defects and their stack structures

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