Progress in riboon ion beam implantation systems development

摘要

The ribbon ion sources for ion implantation are under developing in ITEP during last 5 years. The several versions of Bernas ion source are used for ribbon ion beam production. The beam transport for low energy ribbon beam is one of main problems for ion implantation. The progress in ion sources and transport lines development is discussed in this paper. The new results for carboran clusters ion beam driving are presented.