The flow density of atoms sputtered from a cathode of cylinder magnetron

摘要

The results of calculations of atom flows, sputtered from a cathode of special cylindrical magnetron sputtering system, presented. The atoms flow in cylinder magnetron will be larger with respect to planar magnetron due to the axial symmetry of the system. It is shown that deposition rate weakly depends on the diameter of substrate. The atoms flow through the sidewall is calculated. The estimations of sputtered atoms concentration near cathode surface are done.