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Near coalescent submicron polycrystalline diamond films deposited on silicon: Hydrogen bonding and thermal enhanced carbide formation

机译：靠近聚阳亚微晶金刚石薄膜，沉积在硅上：氢键和热增强碳化物形成

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A. Stacey; Sh. Michaelson; J. Orwa; S. Rubanov; S. Prawer; B. C. C. Cowie; A. Hoffman;
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1. Near coalescent submicron polycrystalline diamond films deposited on silicon: Hydrogen bonding and thermal enhanced carbide formation [J] . A. Stacey, Sh. Michaelson, J. Orwa, Journal of Applied Physics . 2009,第10期

机译：沉积在硅上的近结亚微米多晶金刚石薄膜：氢键结合和热增强碳化物形成
2. Enhancing nucleation density and adhesion of polycrystalline diamond films deposited by HFCVD using surface treaments on Co cemented tungsten carbide [J] . H.Sein, W.Ahmed, M.Jackson, Diamond and Related Materials . 2004,第4a8期

机译：在硬质合金硬质合金上通过表面处理提高通过HFCVD沉积的多晶金刚石膜的成核密度和附着力
3. Effects of Hydrogen Dilution Ratio on Properties of Hydrogenated Nanocrystalline Cubic Silicon Carbide Films Deposited by Very High-Frequency Plasma-Enhanced Chemical Vapor Deposition [J] . Shinsuke MIYAJIMA, Makoto SAWAMURA, Akira YAMADA, Japanese journal of applied physics . 2007,第25a28期

机译：氢稀释比对超高频等离子体化学气相沉积沉积氢化纳米晶立方碳化硅膜性能的影响
4. Hydrogenated amorphous silicon carbide thin films deposited by plasma-enhanced chemical vapor deposition [C] . Shiguo Yang, Guozhi Wen, Yang Luo, International Conference on Sustainable Energy and Environmental Engineering . 2016

机译：通过等离子体增强的化学气相沉积沉积氢化非晶碳化硅薄膜
5. Chemical vapor-deposited boron-doped polycrystalline diamond thin film growth on silicon and sapphire: Growth, doping, metallization, and characterization [D] . Golestanian, Hassan 1997

机译：化学气相沉积硼掺杂多晶金刚石薄膜在硅和蓝宝石上的生长：生长，掺杂，金属化和表征
6. Enhanced Photoluminescence of Hydrogenated Amorphous Silicon Carbide Thin Films by Means of a Fast Thermal Annealing Process [O] . Israel Vivaldo, Roberto C. Ambrosio, Roberto López, 2020

机译：通过快速热退火工艺增强氢化非晶碳化硅薄膜的光致发光
7. Enhancing nucleation density and adhesion of polycrystalline diamond films deposited by HFCVD using surface treaments on Co cementedudtungsten carbide [O] . Sein H, Ahmed W, Jackson M, 2004

机译：通过在Co胶 ud上进行的表面处理来提高HFCVD沉积的多晶金刚石膜的成核密度和附着力碳化钨

Near coalescent submicron polycrystalline diamond films deposited on silicon: Hydrogen bonding and thermal enhanced carbide formation

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