Ion energy and angular distributions in RF capacitively coupled plasma sources

摘要

The possibilities to control ion energy distribution functions (IEDFs) and ion angle distribution functionsud(IADFs) on electrodes in single- and dualfrequency capacitively coupled plasma (CCP) sources are investigated byudmeans of particle-in-cell/Monte Carlo (PIC/MCC) simulations. It is shown that the IEDFs can be controlled by theuddriven voltage and frequency in singlefrequency capacitive discharges. It is demonstrated that the IEDFs and IADFsudcan be controlled by the low frequency voltage in dualfrequency CCP sources.