Cobalt Doping in Tantalum Nitride Thin Films Prepared by Sputtering

机译：通过溅射制备的钽氮化物薄膜掺杂

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Sam Macartney; Leigh Sheppard; Richard Wuhrer;
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1. Synthesis and high temperature XRD studies of tantalum nitride thin films prepared by reactive pulsed dc magnetron sputtering [J] . T. Elangovan, S. Murugeshan, D. Mangalaraj Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics . 2011,第22期

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2. Synthesis and high temperature XRD studies of tantalum nitride thin films prepared by reactive pulsed dc magnetron sputtering [J] . T. Elangovan, S. Murugeshan, D. Mangalaraj Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics . 2011,第22期

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3. Photoluminescence Properties of Europium and Cerium Co-Doped Tantalum-Oxide Thin Films Prepared Using Co-Sputtering Method [J] . Kenta Miura, Tetsuhito Suzuki, Osamu Hanaizumi Journal of Materials Science and Chemical Engineering . 2015,第8期

机译：共溅射法制备的铈铈共掺杂钽氧化物薄膜的光致发光特性
4. Characterization of iron doped titanium nitride thin films prepared by magnetron sputtering [C] . LIN Wen-song, CHEN Jing, ZHOU Ji International Conference on Multifunctional Materials and Structures . 2008

机译：磁控溅射制备的铁掺杂氮化钛薄膜的特征
5. Texture evolution in metal nitride (aluminum nitride, titanium nitride, hafnium nitride) thin films prepared by off-normal incidence reactive magnetron sputtering . [D] . Deniz, Derya. 2008

机译：非垂直入射反应磁控溅射制备的金属氮化物（氮化铝，氮化钛，氮化ha）薄膜的织构演变。
6. The Effect of Sputtering Parameters and Doping of Copper on Surface Free Energy and Magnetic Properties of Iron and Iron Nitride Nano Thin Films on Polymer Substrate [O] . Waheed Khan, Qun Wang, Xin Jin, 2017

机译：溅射参数和铜的掺杂对聚合物基底上铁和氮化铁纳米薄膜表面自由能和磁性能的影响
7. Microstructural evolution of tantalum nitride thin films synthesized by inductively coupled plasma sputtering [O] . Sung-Il Baik, Young-Woon Kim 2020

机译：电感耦合等离子体溅射合成钽氮化物薄膜的微观结构演化

Cobalt Doping in Tantalum Nitride Thin Films Prepared by Sputtering

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