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LASER-INDUCED DECOMPOSITION OF METAL CARBONYLS FOR CHEMICAL VAPOR DEPOSITION OF MICROSTRUCTURES

机译:用于化学气相沉积微结构的激光诱导的金属羰基分解

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摘要

Tungsten and nickel carbonyls were used to produce metal microstructures by laser-induced chemical vapor deposition (CVD) on various substrates. The deposition rate of microstructures produced by thermodecomposition of W(CO)6 on Si substrates heated with a cw Ar+ laser beam was relatively low (10 to 30 nm/s) even at high temperatures (above 900°C). Ni microstructures were deposited on quartz substrates irradiated with a CO2 laser beam. Relatively high laser powers were needed to heat the Ni surface up to 400°C due to the high reflectivity of the metal at 10.59 µm. The Ar+ laser-induced CVD of Ni dots on Si substrates was accomplished with relatively low laser powers ; the deposition rate was several µm/s at low temperatures (200°-400°C). Visible and infrared laser-induced CVD of Ni microstructures was demonstrated to occur via a purely thermal decomposition of Ni(CO)4. The deposition kinetics was limited by the desorption of CO molecules from the Ni surface.
机译:通过各种基材上的激光诱导的化学气相沉积(CVD)来利用钨和镍羰基化学基金来生产金属微结构。通过用CW AR +激光束加热的Si衬底上的W(CO)6的热分解产生的微结构的沉积速率,即使在高温(高于900℃以上)也相对较低(10至30nm / s)。在用CO2激光束照射的石英基板上沉积Ni微结构。需要相对较高的激光功率,由于金属的高反射率为10.59μm,需要高达400℃的Ni表面。通过相对低的激​​光功率完成Si衬底上的AR +激光诱导的Ni点CVD;低温(200°-400°C)的沉积速率为几μm/ s。通过Ni(CO)4的纯热分解,证明了Ni微结构的可见和红外激光诱导的Ni微观结构CVD。沉积动力学受到来自Ni表面的CO分子的解吸的限制。

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