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Effects of Etching Processes on the Properties of pseudo-MOSFETs for the UTSOI Characterization

机译：蚀刻工艺对UTSOI表征伪MOSFET性能的影响

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1. Micro-Raman analysis on LiNbO_3 substrates and surfaces: Compositional homogeneity and effects of etching and polishing processes on structural properties [J] . P. Galinetto, M. Marinone, D. Grando, Optics and Lasers in Engineering . 2007,第3期

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2. Effects of dry etching processes on optical properties of ZnTe surface layers in ultraviolet region [J] . S. Wu, Z.Q. Ren, W.Z. Shen, Applied Surface Science . 2005,第1a4期

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3. Characterization of anisotropic wet etching properties of single crystal silicon: Effects of ppb-level of Cu and Pb in KOH solution [J] . Tanaka H, Cheng D, Shikida M, Sensors and Actuators, A. Physical . 2006,第1期

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4. Effects of Etching Processes on the Properties of Pseudo-MOSFETs for the UTSOI Characterization [C] . Young-Ho Bae, Kyung-Wook Kwon, Jong-Hyun Lee, Proceedings vol.2005-03; Electrochemical Society(ECS) Meeting and International Symposium on Silicon-on-Insulator Technology and Devices; 20050515-20; Quebec City(CA) . 2005

机译：刻蚀工艺对伪MOSFET特性的影响，用于UTSOI表征
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Effects of Etching Processes on the Properties of pseudo-MOSFETs for the UTSOI Characterization

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