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Structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings prepared by the PIIID technique from filtered vacuum-arc plasma

机译:通过PIII&D技术从过滤的真空电弧等离子体中制备的TiN和Ti₀.₅₋xAl₀.₅YxN涂层的结构和应力状态

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摘要

The results of investigations of the structure and stress state of TiN and Ti₀.₅₋xAl₀.₅YxN coatings deposited from the filtered vacuum-arc plasma under high voltage pulsed bias potential on the substrate are presented. It was found that axial texture [110] is formed in coatings when pulses potential with an amplitude 0.5…2.5 kV are applied. For TiN coatings with increasing amplitude of the potential the perfection of texture is increased and the level of residual compressive stress is decreased. As for Ti₀.₅₋xAl₀.₅YxN coatings with increasing amplitude the stress level is increased. In this case the texture is most strong outlined at the amplitude of 1 kV. With further increase in the amplitude the texture perfection becomes weaker. Differences of structure and stress state may occur due to the possibility of phase transition for multi-component coatings Ti-Al-Y-N associated with the decay of the supersaturated solid solution (Ti,Al)N stimulated by high energy ion bombardment.
机译:给出了在高压脉冲偏置电势下,从过滤后的真空电弧等离子体沉积的TiN和Ti3.xxAl3.yYxN涂层的结构和应力状态的研究结果。发现当施加振幅为0.5…2.5 kV的脉冲电势时,涂层中会形成轴向织构[110]。对于势能幅度增大的TiN涂层,织构的完善性得到提高,残余压应力的水平降低了。对于Tiamplitude.₅₋xAl₀.₅YxN涂层,随着振幅的增加,应力水平也随之增加。在这种情况下,纹理在1 kV的振幅处轮廓最强。随着幅度的进一步增加,纹理完美度变弱。由于多组分涂层Ti-Al-Y-N的相变可能与高能离子轰击激发的过饱和固溶体(Ti,Al)N的衰减有关,因此可能会发生结构和应力状态的差异。

著录项

  • 作者

    Reshetnyak E.N.;

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  • 年度 2014
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  • 原文格式 PDF
  • 正文语种 en
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