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Crystallographic and Magnetic Characteristics of Ba Ferrite Sputtered Films for High Density Magnetic Recording Disks

机译:用于高密度磁记录盘的Ba铁氧体溅射膜的晶体特性

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摘要

Ba ferrite films with non-stoichiometric composition were deposited using Facing Targets Sputtering apparatus. The films with well c-axis orientation and remarkable perpendicular anisotropy were attained even at the substrate temperature below 600°C. Sufficiently large saturation magnetization 4πM, of 3.7 kG and small crystallite size below 20 nm were attained using the targets with Fe-excessive composition. Their good crystallographic and magnetic characteristics were thought to be satisfactory for high density magnetic recording media.
机译:使用面对靶溅射装置沉积具有非化学计量组合物的BA铁氧体薄膜。甚至在低于600℃的基板温度下达到具有井C轴取向和显着垂直各向异性的薄膜。使用具有Fe-过量组合物的靶,获得足够大的饱和磁化强度4πm,为3.7kg和低于20nm以下的微晶尺寸。对于高密度磁记录介质,认为它们的良好晶体和磁性特征是令人满意的。

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