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Sputtering Power Induced Physical Property Variation of Nickel Oxide Films by Radio Frequency Magnetron Sputtering

机译：通过射频磁控溅射溅射功率诱导氧化镍膜的物理性能变化

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Yang Zhao; Hui Wang; Fan Yang; Zhiyuan Wang; Jingjie Li; Yutao Gao; Zhennan Feng; Xinzhong Li; Zhiqiang Zhen;
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1. Sputtering Power Induced Physical Property Variation of Nickel Oxide Films by Radio Frequency Magnetron Sputtering [J] . Yang?Zhao, Hui?Wang, Fan?Yang, Materials Research . 2018,第2期

机译：射频磁控溅射法溅射功率引起的氧化镍膜物理性能变化
2. Physical properties of gallium and aluminium co-doped zinc oxide thin films deposited at different radio frequency magnetron sputtering power [J] . Muchuweni E., Sathiaraj T. S., Nyakotyo H. CERAMICS INTERNATIONAL . 2016,第15期

机译：不同射频磁控溅射功率沉积镓和铝的镓和铝共掺杂氧化锌薄膜的物理性质
3. Physical properties of gallium and aluminium co-doped zinc oxide thin films deposited at different radio frequency magnetron sputtering power [J] . Muchuweni E., Sathiaraj T. S., Nyakotyo H. CERAMICS INTERNATIONAL . 2016,第15期

机译：镓和铝共掺杂氧化锌薄膜在不同射频磁控溅射功率下的物理性质
4. Physical Properties of Nano-Structured Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Sputtering [C] . I. Saurdi, M. H. Mamat, M. Rusop International Conference on Nanoscience Nanotechnology . 2013

机译：射频磁控溅射沉积纳米结构氧化锌薄膜的物理性质
5. Radio-frequency magnetron triode sputtering of cadmium telluride and zinc telluride films and solar cells. [D] . Sanford, Adam Lee. 2002

机译：碲化镉和碲化锌薄膜以及太阳能电池的射频磁控三极管溅射。
6. Spatially Resolved Optoelectronic Properties of Al-Doped Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Plasma Sputtering Without Substrate Heating [O] . Eugen Stamate 2020

机译：在不加热衬底的情况下通过射频磁控等离子体溅射沉积的铝掺杂氧化锌薄膜的空间分辨光电性能
7. Characterizations of nickel oxide thin films prepared by reactive radio frequency magnetron sputtering [O] . Z.H. Xiao, X.F. Xia, S.J. Xu, 2015

机译：反应射频磁控溅射制备的氧化镍薄膜的特征

Sputtering Power Induced Physical Property Variation of Nickel Oxide Films by Radio Frequency Magnetron Sputtering

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