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Comparative Study of Furnace and Flash Lamp Annealed Silicon Thin Films Grown by Plasma Enhanced Chemical Vapor Deposition

机译：等离子体增强化学气相沉积的炉子和闪光灯退火硅薄膜的比较研究

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Maheshwar Shrestha; Keliang Wang; Bocong Zheng; Laura Mokrzycki; Qi Fan;
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1. Comparative Study of Furnace and Flash Lamp Annealed Silicon Thin Films Grown by Plasma Enhanced Chemical Vapor Deposition [J] . Maheshwar Shrestha, Keliang Wang, Bocong Zheng, Coatings . 2018,第3期

机译：等离子体增强化学气相沉积法制备的炉膛和闪光灯退火硅薄膜的比较研究
2. High-Quality Polycrystalline Silicon Films with Minority Carrier Lifetimes over 5 μs Formed by Flash Lamp Annealing of Precursor Amorphous Silicon Films Prepared by Catalytic Chemical Vapor Deposition [J] . Keisuke Ohdaira, Shogo Nishizaki, Yohei Endo, Japanese journal of applied physics . 2007,第11Pt1期

机译：催化化学气相沉积制备的前驱体非晶硅薄膜的闪光灯退火形成的高质量载流子寿命在5μs以上的多晶硅薄膜
3. Comparative Study of Diamond Films Grown on Silicon Substrate Using Microwave Plasma Chemical Vapor Deposition and Hot-Filament Chemical Vapor Deposition Technique [J] . Mushtaq Ahmad Dar, Young-Soon Kim, Shafeeque G Ansari, The Korean journal of chemical engineering . 2005,第5期

机译：微波等离子体化学气相沉积和热丝化学气相沉积技术在硅衬底上生长金刚石薄膜的比较研究
4. Low Temperature (75℃) Hydrogenated Nanocrystalline Silicon Films grown by Conventional Plasma Enhanced Chemical Vapor Deposition for Thin Film Transistors [C] . Czang-Ho Lee, Andrei Sazonov, Arokia Nathan Symposium Proceedings vol.808; Symposium on Amorphous and Nanocrystalline Silicon Science and Technology - 2004; 20040413-16; San Francisco,CA(US) . 2004

机译：常规等离子增强化学气相沉积薄膜晶体管生长的低温（75℃）氢化纳米晶硅薄膜
5. Plasma enhanced chemical vapor deposition of silicon thin films: Characterization of film growth at different frequencies and gas compositions utilizing plasma diagnostics. [D] . Zhu, Lala. 2014

机译：等离子体增强了硅薄膜的化学气相沉积：利用等离子体诊断技术表征不同频率和气体成分下的薄膜生长。
6. Antibacterial Silicon Oxide Thin Films Doped with Zinc and Copper Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition [O] . Elisabeth Jäger, Jürgen Schmidt, Andreas Pfuch, 2019

机译：常压等离子体化学气相沉积法生长掺锌铜的抗菌氧化硅薄膜
7. Annealing and oxidation of silicon oxide films prepared by plasma-enhanced chemical vapor deposition [O] . Chen, X. Y., Lu, Yongfeng, Tang, L. J., 2004

机译：通过等离子体增强化学气相沉积制备的氧化硅膜的退火和氧化

Comparative Study of Furnace and Flash Lamp Annealed Silicon Thin Films Grown by Plasma Enhanced Chemical Vapor Deposition

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