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Surface Pattern over a Thick Silica Film to Realize Passive Radiative Cooling

机译:厚二氧化硅膜的表面图案实现被动辐射冷却

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摘要

Passive radiative cooling, which cools an item without any electrical input, has drawn much attention in recent years. In many radiative coolers, silica is widely used due to its high emissivity in the mid-infrared region. However, the performance of a bare silica film is poor due to the occurrence of an emitting dip (about 30% emissivity) in the atmospheric transparent window (8–13 μm). In this work, we demonstrate that the emissivity of silica film can be improved by sculpturing structures on its surface. According to our simulation, over 90% emissivity can be achieved at 8–13 μm when periodical silica deep grating is applied on a plane silica film. With the high emissivity at the atmospheric transparent window and the extremely low absorption in the solar spectrum, the structure has excellent cooling performance (about 100 W/m2). The enhancement is because of the coupling between the incident light with the surface modes. Compared with most present radiative coolers, the proposed cooler is much easier to be fabricated. However, 1-D gratings are sensitive to incident polarization, which leads to a degradation in cooling performance. To solve this problem, we further propose another radiative cooler based on a silica cylinder array. The new cooler’s insensitivity to polarization angle and its average emissivity in the atmospheric transparent window is about 98%. Near-unit emissivity and their simple structures enable the two coolers to be applied in real cooling systems.
机译:无源辐射冷却,冷却物品而没有任何电气输入,近年来引起了很多关注。在许多辐射冷却器中,由于其中红外区域的高发射率,基二氧化硅被广泛使用。然而,裸二氧化硅膜的性能差由于发光浸在大气透明窗口(8-13微米)的发生(约30%的发射率)。在这项工作中,我们证明可以通过在其表面上雕刻结构来改善二氧化硅膜的发射率。根据我们的模拟,在施加在平面二氧化硅膜上时,在8-13μm下,可以在8-13μm下实现90%的发射率。在大气透明窗口的高发射率和太阳光谱中极低吸收,该结构具有优异的冷却性能(约100W / m 2)。增强是因为与表面模式的入射光之间的耦合。与大多数情况下的辐射冷却器相比,所提出的冷却器更容易制造。然而,1-D光栅对入射极化敏感,导致冷却性能的降解。为了解决这个问题,我们进一步提出了一种基于二氧化硅圆筒阵列的另一辐射冷却器。新的冷却器对偏振角的不敏感性及其在大气透明窗口中的平均发射率约为98%。近单位发射率及其简单的结构使两种冷却器能够在真正的冷却系统中应用。

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