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Atmospheric-Pressure Synthesis of Atomically Smooth, Conformal, and Ultrathin Low-k Polymer Insulating Layers by Plasma-Initiated Chemical Vapor Deposition

机译：通过等离子体引发的化学气相沉积大气压 - 压缩和超薄的低k聚合物绝缘层的大气压合成

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作者
Dominique Abessolo Ondo; François Loyer; Florian Werner; Renaud Leturcq; Phillip J. Dale; Nicolas D. Boscher;
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年度 2019
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入库时间 2022-08-20 22:09:39

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1. Synthesis of ultrathin polymer insulating layers by initiated chemical vapour deposition for low-power soft electronics [J] . Hanul Moon, Hyejeong Seong, Woo Cheol Shin, Nature Materials . 2015,第6期

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2. Atomic Layer Deposition: Conformal Physical Vapor Deposition Assisted by Atomic Layer Deposition and Its Application for Stretchable Conductors (Adv. Mater. Interfaces 22/2018) [J] . Min Joong‐Hee, Chen Yi‐An, Chen I‐Te, Advanced materials interfaces . 2018,第22期

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3. Atomic and Electronic Structure of Amorphous and Nanocrystalline Layers of Semi-Insulating Silicon Produced by Chemical-Vapor Deposition at Low Pressures [J] . E. P. Domashevskaya, V. A. Terekhov, S. Yu. Turishchev, Journal of surface investigation: x-ray, synchrotron and neutron techniques . 2015,第6期

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4. Surface Smoothing Effect of an Amorphous Thin Film Deposited by Chemical Vapor Deposition or Atomic Layer Deposition [C] . W.S. Lau, J. Zhang, X. Wan, China Semiconductor Technology International Conference . 2014

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5. Plasma-assisted atomic layer deposition of conformal nano-cap layers on self-assembled mesoporous low-k dielectrics. [D] . Jiang, Ying-Bing. 2005

机译：自组装介孔低k电介质上的共形纳米帽层的等离子体辅助原子层沉积。
6. Controlled Synthesis of Atomically Layered Hexagonal Boron Nitride via Chemical Vapor Deposition [O] . Juanjuan Liu, R. Govindan Kutty, Zheng Liu 2016

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7. Pore Narrowing and Formation of Ultrathin Yttria-Stabilized Zirconia Layers in Ceramic Membranes by Chemical Vapor Deposition/Electrochemical Vapor Deposition [O] . Cao Guo-Zhong, Brinkman Hendrik W., Meijerink Joan, 1993

机译：化学气相沉积/电化学气相沉积法在陶瓷膜中孔隙缩小和超薄氧化钇稳定氧化锆层的形成

Atmospheric-Pressure Synthesis of Atomically Smooth, Conformal, and Ultrathin Low-k Polymer Insulating Layers by Plasma-Initiated Chemical Vapor Deposition

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