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THE ROLE OF MICROWAVE PLASMA TEMPERATURE DURING GRAPHENE NANOSHEETS DEPOSITION ON DIELECTRIC SUBSTRATE: MODELLING AND EXPERIMENT

机译：微波等离子体温度在介电基板上沉积的微波等离子体温度的作用：建模与实验

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Martin KUBEČKA; Jozef TOMAN; Miroslav ŠNÍRER; Ondřej JAŠEK; Vít KUDRLE; Jana JURMANOVÁ;
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1. Copper-Assisted Direct Growth of Vertical Graphene Nanosheets on Glass Substrates by Low-Temperature Plasma-Enhanced Chemical Vapour Deposition Process [J] . Yifei Ma, Haegyu Jang, Sun Jung Kim, Nanoscale Research Letters . 2015,第1期

机译：低温等离子体增强化学气相沉积法在玻璃基板上铜辅助垂直石墨烯纳米片的直接生长
2. Thin film deposition method for ZnO nanosheets using low-temperature microwave-excited atmospheric pressure plasma jet [J] . Shahiduzzaman Md, Yamada Ryosuke, Chikamatsu Tatsuki, Thin Solid Films . 2019,第MARa31期

机译：低温微波激发大气压等离子体射流沉积ZnO纳米片的薄膜方法
3. Improvement of multilayer graphene synthesis on copper substrate by microwave plasma process using helium at low temperatures [J] . Ryuichi Kato, Kazuo Tsugawa, Takatoshi Yamada, Japanese journal of applied physics . 2014,第1期

机译：低温氦气微波等离子体法改善铜基多层石墨烯的合成
4. Effect of CO_2 and O_3 treatment on directly Synthesized Graphene on Insulating Substrates at low temperature using Microwave Plasma Enhanced Chemical Vapor Deposition [C] . Riteshkumar Vishwakarma, Zhu Rucheng, Amr Abulwafa, 2019年第66回応用物理学会春季学術講演会講演予稿集 . 2019

机译：微波等离子体化学气相沉积法低温处理CO_2和O_3对绝缘基板直接合成石墨烯的影响
5. Modeling of hydrogen-based plasmas in microwave plasma-assisted chemical vapor deposition reactors at moderate pressures. [D] . Meierbachtol, Collin Stephen. 2013

机译：在中等压力下在微波等离子体辅助化学气相沉积反应器中对氢基等离子体进行建模。
6. Copper-Assisted Direct Growth of Vertical Graphene Nanosheets on Glass Substrates by Low-Temperature Plasma-Enhanced Chemical Vapour Deposition Process [O] . Yifei Ma, Haegyu Jang, Sun Jung Kim, 2015

机译：低温等离子体增强化学气相沉积法在玻璃基板上铜辅助垂直石墨烯纳米片的直接生长
7. Copper-Assisted Direct Growth of Vertical Graphene Nanosheets on Glass Substrates by Low-Temperature Plasma-Enhanced Chemical Vapour Deposition Process [O] . Yifei Ma, Haegyu Jang, Sun Jung Kim, 2015

机译：低温等离子体增强化学气相沉积法在玻璃基板上铜辅助垂直石墨烯纳米片的直接生长

THE ROLE OF MICROWAVE PLASMA TEMPERATURE DURING GRAPHENE NANOSHEETS DEPOSITION ON DIELECTRIC SUBSTRATE: MODELLING AND EXPERIMENT

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