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Recovery Time of Silicon Photomultiplier with Epitaxial Quenching Resistors

机译:具有外延淬火电阻的硅光电倍增器的恢复时间

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摘要

The silicon photomultiplier (SiPM) is a promising semiconductor device for low-level light detection. The recovery time, or the photon-counting rate of the SiPM is essential for high-flux photon detection in such applications as photon counting computer tomography (CT). A SiPM with epitaxial quenching resistors (EQR SiPM) has advantages in fabricating small APD microcells connected in series with lower quenching resistors, therefore, APD cells with a low RC time constant and a short recovery time can be expected. In this report, the recovery time of EQR SiPM has been investigated using both the double light pulse method and the waveform analysis method. The results show that the recovery time of EQR SiPM is strongly dependent on the size of the active area and the number of fired pixels. For a 3 × 3 mm2 device, while total about 90,000 pixels were fired, the recovery time was 31.1 ± 1.8 ns; while fired pixels were controlled to about 2000, the recovery time decreased significantly to 6.5 ± 0.4 ns; and the recovery time of one fired pixel was 3.1 ± 0.2 ns. For 1.4 × 1.4 mm2 device, the recovery time was 15.2 ± 0.5 ns, while a total of about 20,000 pixels were fired. Effects that may affect the recovery time of the SiPM, including strength of the pulse light, signal transmission time delay, and the readout electronics are discussed.
机译:的硅光电倍增器管(SiPM)为低电平光检测有希望的半导体装置。恢复时间,或所述的SiPM的光子计数率是在这样的应用中作为光子计数计算机断层扫描(CT)高通量光子检测是必不可少的。甲的SiPM与外延灭弧电阻(EQR的SiPM)具有在制造连接与较低的淬火电阻一系列小APD微优点,因此,可以预期具有低RC时间常数和一个短的恢复时间APD细胞。在本报告中,EQR的SiPM的恢复时间已经使用两个双光脉冲法和波形分析法研究。结果表明,EQR的SiPM的恢复时间在很大程度上取决于有效区域的大小和发射的像素数。对于3×3平方毫米设备,而总约90,000个像素被解雇,恢复时间为31.1±1.8纳秒;同时烧制像素分别约2000控制为,恢复时间显著下降至6.5±0.4纳秒;和一个发射像素的恢复时间为3.1±0.2纳秒。为1.4×1.4平方毫米装置中,恢复时间为15.2±0.5纳秒,而总共约20,000个像素被解雇。讨论效应可能影响的SiPM的恢复时间,包括的脉冲光的强度,信号传输时间延迟,和读出电子器件。

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