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Characteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings

机译：用硬涂层DC磁控溅射法制备锡薄膜的特性

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Young-Ryeol Kim; Yong-Seob Park; Won-Seok Choi; Byung-You Hong;
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年度 2008
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1. Effect of Coating Thickness (25–100 nm) on Properties of TiO₂ Thin Films Prepared by DC Magnetron Sputtering with a TiO₂ Target and Post-Annealing Process [J] . Advanced Science Letters . 2018,第11期

机译：涂层厚度（25-100nm）对TiO _{2 薄膜性能的影响，DC磁控溅射用TiO _{2 靶和后退火过程}}
2. Raman spectroscopy measurements of DC-magnetron sputtered carbon nitride (a-C:N) thin films for magnetic hard disk coatings [J] . Joeris H.P., Neuhaeuser M. Diamond and Related Materials . 2000,第8期

机译：用于磁性硬盘涂层的直流磁控溅射氮化碳（a-C：N）薄膜的拉曼光谱测量
3. Mechanical properties of superhard TiB2 coatings prepared by DC magnetron sputtering [J] . Mikula M, Grancic B, Bursikova V, Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2007,第2期

机译：直流磁控溅射制备超硬TiB2涂层的力学性能
4. Influence of substrate temperature on properties of indium tin oxide thin films prepared by DC magnetron sputtering [C] . Xu Juan, Yuan YuJie, Wang Fang, China Semiconductor Technology International Conference . 2012

机译：衬底温度对直流磁控溅射制备铟锡氧化物薄膜性能的影响
5. An investigation of material properties and tribological performance of magnetron sputtered thin film coatings [D] . Singh, Harpal. 2016

机译：磁控溅射薄膜涂层材料特性及摩擦学性能研究
6. Processing and Study of Optical and Electrical Properties of (Mg Al) Co-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering for Photovoltaic Application [O] . Chayma Abed, Susana Fernández, Selma Aouida, 2020

机译：射频磁控溅射制备（MgAl）共掺杂ZnO薄膜的光电性能研究与研究
7. A Transmission Electron-Microscopy Study of RF-Magnetron-Sputtered and DC-Magnetron-Sputtered Thin-Film Chromium and Chromium Platinum Coatings [O] . Fishkis M. R, Sisson Richard D. Jr., Biederman Ronald R. 1985

机译：射频磁控溅射和直流磁控溅射薄膜铬和铬铂涂层的透射电子显微镜研究

Characteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings

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