Field emission of electrons from silicon tips with porous silicon layers on their surface has been investigated. The silicon tip arrays were formed by wet chemical etching of n-type Si. The wafers with piramidal emitters were then anodized to form on the surface a porous silicon layer. The conditions of the anodic etching of silicon in ethanol solution of HF under the illumination have been changed widely. The investigation of influence of the thin diamond-like carbon film on different porous silicon layers on electron field emission have been performed. The parameters of the emission efficiency such as field enhancement factors, emitting area factors and threshold voltages for comparison and characterization of different layer structures have been estimated from current-voltage dependences. The results show significant influence of preparation technology of layer structures on their emission properties.
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