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Effects of Ni layer as a diffusion barrier on the aluminum-induced crystallization of the amorphous silicon on the aluminum substrate

机译：Ni层作为扩散屏障对铝基铝基铝诱导的铝诱导结晶的影响

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Won-Tae Yun; Young-Kwan Kim;
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年度 2012
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1. Controlled Aluminum-induced Crystallization of an Amorphous Silicon Thin Film by Using an Oxide-layer Diffusion Barrier [J] . Ji-Hyun Hwang, Hyunmin Kwak, Myeung Hoi Kwon Journal of the Korean Physical Society . 2014,第5期

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2. Study of growing zinc oxide on polycrystalline silicon/glass substrate prepared by aluminum-induced crystallization of amorphous silicon [J] . J.D. Hwang, W.J. Yan, J.H. Chen Materials science in semiconductor processing . 2014,第Null期

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4. Effects of Power Density and Thickness On Aluminum-Induced Crystallization of PECVD Amorphous Silicon [C] . Kendrick S Hsu, Jeremy Ou-Yang, Li P. Ren, MRS spring meeting . 2007

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5. Tribology of silicon nano-textured surfaces fabricated by rapid aluminum-induced crystallization of amorphous silicon. [D] . Premachandran Nair, Rahul. 2007

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7. Investigation of aluminum-induced crystallization of amorphous silicon and crystal properties of the silicon film for polycrystalline silicon solar cell fabrication [O] . Hye-Jeong Jeong, Jong-Ho Lee, Seong-Jae Boo 2010

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Effects of Ni layer as a diffusion barrier on the aluminum-induced crystallization of the amorphous silicon on the aluminum substrate

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