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Spectral measurements of inductively coupled and m = +1, −1 helicon discharge modes of the constructed plasma source

机译:电感耦合的光谱测量和由构造的等离子体源的电感耦合和M = +1,-1螺旋放电模式

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摘要

In the present context, the industrial type of Amirkabir helicon plasma source has been introduced that was designed and constructed at the Helicon Plasma Laboratory of Amirkabir University of Technology with the aim of using it in material processing applications. Helicon plasma in two m = +1 and m = −1 modes of operation was studied, and also its application was compared with the inductively coupled plasma (ICP) mode in this experimental work. This study was performed by employing two techniques including optical emission spectroscopy and imaging using a camera with polarizing filters, in which the images and spectra of ICP and m = +1, −1 helicon plasma modes were recorded under the experimental conditions. The effects of the device operational parameters on the argon plasma emission spectra were investigated in the wavelength range of 350–950 nm. It was observed from the comparison of the plasma spectra that the ionization rate increases significantly for the plasma helicon mode than ICP and also for m = +1 helicon mode of operation than m = −1. In this work, the values of device operational parameters such as the RF power delivered to the half-helix antenna, external magnetic field intensity, and the injected gas flow rate were varied in the range of 400–900 W, 100–300 mT, and 1–10 SCCM in the experiment, respectively. In addition, the optimum values of RF power, magnetic field intensity, and the injected gas flow rate for achieving the maximum ionization rate were, respectively, obtained as 900 W, 300 mT, and 3 SCCM.
机译:在本文中,已经引入了Amirkabir Helicon等离子体源的工业类型,其在Amirkabir技术大学的Helicon Plasma实验室设计和构建,目的是在材料加工应用中使用它。在两个m = +1和m = -1的操作模式下,研究了Helicon等离子体,并且在该实验工作中将其应用与电感耦合等离子体(ICP)模式进行了比较。本研究通过使用包括光发射光谱和使用具有偏振滤光器的相机的两种技术进行的技术进行,其中在实验条件下记录ICP和M = +1,-1 -1 Helicon等离子体模式的图像和光谱。在350-950nm的波长范围内研究了装置操作参数对氩等离子体发射光谱的影响。从等离子体光谱的比较观察到离子化速率比ICP和M = + 1 Helicon操作模式显着增加了比M = -1的M = + 1升。在这项工作中,设备操作参数的值,例如传送到半螺旋天线,外部磁场强度和注入的气体流速的RF功率在400-900W,100-300mt的范围内变化。分别在实验中的1-10个SCCM。另外,RF功率,磁场强度和用于实现最大电离速率的注入气体流速的最佳值分别获得为900W,300mT和3SCCM。

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