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Micro-Raman Characterization of Structural Features of High-k Stack Layer of SOI Nanowire Chip, Designed to Detect Circular RNA Associated with the Development of Glioma

机译：SOI纳米线芯片高k堆叠层结构特征的微拉曼特征，旨在检测胶质瘤的发育相关的圆形RNA

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Yuri D. Ivanov; Kristina A. Malsagova; Vladimir P. Popov; Igor N. Kupriyanov; Tatyana O. Pleshakova; Rafael A. Galiullin; Vadim S. Ziborov; Alexander Yu. Dolgoborodov; Oleg F. Petrov; Andrey V. Miakonkikh; Konstantin V. Rudenko; Alexander V. Glukhov; Alexander Yu. Smirnov; Dmitry Yu. Usachev; Olga A. Gadzhieva; Boris A. Bashiryan; Vadim N. Shimansky; Dmitry V. Enikeev; Natalia V. Potoldykova; Alexander I. Archakov;
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1. Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection [J] . Kristina A. Malsagova, Tatyana O. Pleshakova, Andrey F. Kozlov, Biosensors . 2018,第3期

机译：显微拉曼光谱法，用于监测高k堆栈保护层在纳米线FET芯片上的沉积质量，以进行高灵敏度的miRNA检测
2. X-ray, micro-Raman, and infrared spectroscopy structural characterization of self-assembled multilayer silane films with variable numbers of stacked layers [J] . Baptiste A., Gibaud A., Bardeau JF., Langmuir: The ACS Journal of Surfaces and Colloids . 2002,第10期

机译：具有可变数量堆叠层的自组装多层硅烷膜的X射线，显微拉曼光谱和红外光谱结构表征
3. Experimental Demonstration of Stacked Gate- All-Around Poly-Si Nanowires Negative Capacitance FETs With Internal Gate Featuring Seed Layer and Free of Post-Metal Annealing Process [J] . Lee Shen-Yang, Chen Han-Wei, Shen Chiuan-Huei, IEEE Electron Device Letters . 2019,第11期

机译：具有内部栅极具有种子层且无金属后退火工艺的堆叠式栅极全能多晶硅纳米线负电容FET的实验演示
4. Integration of ALD high-k dipole layers into CMOS SOI nanowire FETs for bi-directional threshold voltage engineering [C] . Wonil Chung, Dongqi Zheng, Wei-E Wang, IEEE Silicon Nanoelectronics Workshop . 2020

机译：将ALD高k偶极子层集成到CMOS SOI纳米线FET中以进行双向阈值电压工程设计
5. Ballistic electron emission microscopy and internal photoemission study on metal bi-layer/oxide/silicon, high-k oxide/silicon, and "end-on" metal contacts to vertical silicon nanowires. [D] . Cai, Wei. 2010

机译：金属双层/氧化物/硅，高k氧化物/硅以及垂直硅纳米线的“端对端”金属触点的弹道电子发射显微镜和内部光发射研究。
6. Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection [O] . Kristina A. Malsagova, Tatyana O. Pleshakova, Andrey F. Kozlov, 2018

机译：显微拉曼光谱法用于监测高k堆栈保护层在纳米线FET芯片上的沉积质量以进行高灵敏度的miRNA检测
7. Micro-Raman Spectroscopy for Monitoring of Deposition Quality of High-k Stack Protective Layer onto Nanowire FET Chips for Highly Sensitive miRNA Detection [O] . Kristina Malsagova, Tatyana Pleshakova, Andrey Kozlov, 2018

机译：微拉曼光谱，用于监测高k堆叠保护层的沉积质量，在纳米线FET芯片上进行高敏感的miRNA检测

Micro-Raman Characterization of Structural Features of High-k Stack Layer of SOI Nanowire Chip, Designed to Detect Circular RNA Associated with the Development of Glioma

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