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Recent trends surrounding gas barrier enhancement technology for PET bottles coated with amorphous carbon thin film through plasma chemical vapor deposition,

机译：通过等离子体化学气相沉积涂有非晶碳薄膜的PET瓶周围气体屏障增强技术的近期趋势。

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Katsuya KATO; Masaki NAKAYA;
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1. Gas barrier properties of hydrogenated amorphous carbon films coated on polymers by surface-wave plasma chemical vapor deposition [J] . Akihisa Ogino, Masaaki Nagatsu Thin Solid Films . 2007,第7a8期

机译：通过表面波等离子体化学气相沉积法在聚合物上涂覆的氢化非晶碳膜的阻气性
2. Structure And Gas-barrier Properties Of Amorphous Hydrogenated Carbon Films Deposited On Inner Walls Of Cylindrical Polyethylene Terephthalate By Plasma-enhanced Chemical Vapor Deposition [J] . Jing Li, Chunzhi Gong, Xiubo Tian, Applied Surface Science . 2009,第7期

机译：等离子体增强化学气相沉积法沉积在圆柱形聚对苯二甲酸乙二醇酯内壁上的非晶氢化碳膜的结构和阻气性能
3. Optical, mechanical and surface properties of amorphous carbonaceous thin films obtained by plasma enhanced chemical vapor deposition and plasma immersion ion implantation and deposition [J] . Rafael G. Turri, Ricardo M. Santos, Elidiane C. Rangel, Applied Surface Science . 2013,第sepa1期

机译：通过等离子体增强化学气相沉积和等离子体浸没离子注入和沉积获得的非晶态碳质薄膜的光学，机械和表面特性
4. In situ plasma analysis, fluorine incorporation, thermostability, stress, and hardness comparison of fluorinated amorphous carbon and hydrogenated amorphous carbon thin films deposited on Si by plasma enhanced chemical vapor deposition [C] . A.D.Glew, M.A.Cappelli, M.N.Touzelbaev, Symposium on low-dielectric constant materials . 1999

机译：原位等离子体分析，通过等离子体增强化学气相沉积法沉积在Si上的氟化非晶碳和氢化非晶碳薄膜的氟掺入，热稳定性，应力和硬度比较
5. Plasma enhanced chemical vapor deposition of silicon thin films: Characterization of film growth at different frequencies and gas compositions utilizing plasma diagnostics. [D] . Zhu, Lala. 2014

机译：等离子体增强了硅薄膜的化学气相沉积：利用等离子体诊断技术表征不同频率和气体成分下的薄膜生长。
6. Investigations on the Role of N2:(N2 + CH4) Ratio on the Growth of Hydrophobic Nanostructured Hydrogenated Carbon Nitride Thin Films by Plasma Enhanced Chemical Vapor Deposition at Low Temperature [O] . Noor Hamizah Khanis, Richard Ritikos, Shafarina Azlinda Ahmad Kamal, 2017

机译：N2：（N2 + CH4）比在低温等离子体增强化学气相沉积法生长疏水纳米结构氢化氮化碳薄膜中的作用研究
7. Optical, mechanical and surface properties of amorphous carbonaceous thin films obtained by plasma enhanced chemical vapor deposition and plasma immersion ion implantation and deposition [O] . Turri Rafael G., Santos Ricardo M., Rangel Elidiane C., 2013

机译：通过等离子体增强化学气相沉积和等离子体浸没离子注入和沉积获得的非晶态碳质薄膜的光学，机械和表面特性
8. Amorphous Carbon Films as Planarization Layers Deposited by Plasma-Enhanced Chemical Vapor Deposition. [R] . Pang, S. W., Horn, M. W. 1990

机译：通过等离子体增强化学气相沉积沉积的无定形碳膜作为平面化层。

Recent trends surrounding gas barrier enhancement technology for PET bottles coated with amorphous carbon thin film through plasma chemical vapor deposition,

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