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Study the Addition of Lab-Made Gas Mixing Unit with Varying of Inter-Electrode Distances on the Characterization of DC Magnetron Sputtering System

机译：研究在DC磁控溅射系统的表征上改变电极间距离的实验室制成气体混合单元的添加

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Bahaa T. Chiad; Firas J. Kadhim; Ahmed A. Anber;
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1. Study the Addition of Lab-Made Gas Mixing Unit with Varying of Inter-Electrode Distances on the Characterization of DC Magnetron Sputtering System [J] . Bahaa T. Chiad, Firas J. Kadhim, Ahmed A. Anber Open Access Library Journal . 2017,第1期

机译：研究在DC磁控溅射系统的表征上改变电极间距离的实验室制成气体混合单元的添加
2. Effect of Cu addition on the microstructure and properties of TiB2 films deposited by a hybrid system combining high power impulse magnetron sputtering and pulsed dc magnetron sputtering [J] . Ding Ji Cheng, Zhang Teng Fei, Yun Je Moon, Surface & Coatings Technology . 2018,第期

机译：Cu的作用对由高功率脉冲磁控溅射和脉冲DC磁控溅射组合的混合系统沉积的TIB2膜微观结构和性能
3. Ga-doped ZnO films deposited with varying sputtering powers and substrate temperatures by pulsed DC magnetron sputtering and their property improvement potentials [J] . Sanghun Lee, Dongkeun Cheon, Won-Jeong Kim, Applied Surface Science . 2012,第17期

机译：通过脉冲直流磁控溅射以不同的溅射功率和衬底温度沉积的Ga掺杂ZnO薄膜及其性能改善潜力
4. Effects of Ti addition in WO_3 thin film ammonia gas sensor prepared by dc reactive magnetron sputtering [C] . HU Ming, YONG Cholyun, FENG Youcai, International Symposium on Instrumentation and Control Technology; 20061013-15; Beijing(CN) . 2006

机译：直流反应磁控溅射制备WO_3薄膜氨气传感器中添加Ti的影响
5. Investigation of the effect of hafnium and chromium additions on the microstructures and short-term oxidation properties of DC magnetron sputtered beta-nickel-aluminum bond coats deposited on nickel-based superalloys. [D] . Bestor, Michael A. 2010

机译：研究ha和铬的添加对沉积在镍基高温合金上的直流磁控溅射β-镍-铝粘结涂层的微观结构和短期氧化性能的影响。
6. Comparative study between a single unit system and a two-unit cold standby system with varying demand [O] . Reetu Malhotra, Gulshan Taneja -1

机译：需求变化的单机系统和两机冷备系统之间的比较研究
7. CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study [O] . Greczynski, Grzegorz, Jensen, Jens, Hultman, Lars 2010

机译：直流磁控溅射与大功率脉冲磁控溅射制备CrNx薄膜的比较研究

Study the Addition of Lab-Made Gas Mixing Unit with Varying of Inter-Electrode Distances on the Characterization of DC Magnetron Sputtering System

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