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Large-Area Low-Cost Plasmonic Perfect Absorber Chemical Sensor Fabricated by Laser Interference Lithography

机译：由激光干扰光刻制造的大面积低成本等离子体完美吸收剂化学传感器

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1. Large-area, low-cost, ultra-broadband, infrared perfect absorbers by coupled plasmonic-photonic micro-cavities [J] . Guiqiang Liu, Yi Liu, Xiaoshan Liu, Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion . 2018,第期

机译：大面积，低成本，超宽带，红外线完美吸收器通过耦合等离子体 - 光子微腔
2. Large-area two-dimensional silicon photonic crystals for infrared light fabricated with laser interference lithography [J] . L Prodan, T G Euser, H A G M van Wolferen Nanotechnology . 2004,第5期

机译：激光干涉光刻技术制备的大面积二维硅红外光子晶体
3. Grating-Coupled Plasmonic Sensor for Sucrose Sensing Fabricated Using Optical Fiber-Based Interference Lithography (OFIL) System [J] . Pae Jian Yi, Sahoo Pankaj K., Matham Murukeshan Vadakke IEEE sensors journal . 2019,第22期

机译：光栅耦合等离子体传感器，用于基于光纤干涉光刻技术的蔗糖传感
4. Aluminum infrared plasmonic perfect absorbers fabricated by colloidal lithography [C] . Thang Duy Dao, Kai Chen, Satoshi Ishii, Conference on Lasers and Electro-Optics Pacific Rim . 2015

机译：胶体光刻技术制备的铝红外等离子体完美吸收体
5. Stretchable, multimodal, large-area sensor arrays fabricated using excimer laser photoablation technologies. [D] . Lin, Kevin L. 2011

机译：使用受激准分子激光光蚀技术制造的可拉伸，多峰，大面积传感器阵列。
6. Omnidirectional and Broadband Antireflection Effect with Tapered Silicon Nanostructures Fabricated with Low-Cost and Large-Area Capable Nanosphere Lithography [O] . Sangho Kim, Gwan Seung Jeong, Na Yeon Park, 2021

机译：用低成本和大面积纳米光刻制造的锥形硅纳米结构的全向和宽带抗反射效果
7. Large-area fabrication of TiN nanoantenna arrays for refractory plasmonics in the mid-infrared by femtosecond direct laser writing and interference lithography Invited [O] . Shahin Bagheri, Christine M. Zgrabik, Timo Gissibl, 2015

机译：由飞秒直射写作和干扰性光刻中红外线中耐火沉降型intan纳米纳米阵列的大面积制造邀请

Large-Area Low-Cost Plasmonic Perfect Absorber Chemical Sensor Fabricated by Laser Interference Lithography

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