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Planarization and fabrication of bridges across deep grooves or holes in silicon using a dry film photoresist followed by an etch back

机译：使用干膜光致抗蚀剂，硅在硅中的深槽或孔穿过深沟或孔的平坦化和制造。

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V L Spiering; J W Berenschot; M Elwenspoek;
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年度 1995
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1. PLANARIZATION AND FABRICATION OF BRIDGES ACROSS DEEP GROOVES OR HOLES IN SILICON USING A DRY FILM PHOTORESIST FOLLOWED BY AN ETCH BACK [J] . Spiering VL., Elwenspoek M., Berenschot JW. Journal of Micromechanics and Microengineering . 1995,第2期

机译：硅片上沿深沟槽或孔的平面化和制造，其后使用后退的干膜光致抗蚀剂
2. PLANARIZATION AND FABRICATION OF BRIDGES ACROSS DEEP GROOVES OR HOLES IN SILICON USING A DRY FILM PHOTORESIST FOLLOWED BY AN ETCH BACK [J] . Spiering VL., Elwenspoek M., Berenschot JW. Journal of Micromechanics and Microengineering . 1995,第2期

机译：硅片上沿深沟槽或孔的平面化和制造，其后使用后退的干膜光致抗蚀剂
3. PLANARIZATION AND FABRICATION OF SACRIFICIAL MEMBRANES ACROSS DEEP GROOVES IN SILICON BY GLASS SOOT DEPOSITION [J] . Wuu DS., Cheng CY., Horng RH. Journal of Micromechanics and Microengineering . 1997,第4期

机译：玻璃粉尘沉积法在整个硅谷中的牺牲膜的制备和制备
4. Fabrication and Characterization of 200μm Deep, Dry Etched Via Holes for GaAs MMICs [C] . D. S. Rawal, Vanita R. Agarwal, H. S. Sharma, International Workshop on the Physics of Semiconductor Devices . 2002

机译：200μm深，干燥蚀刻通孔的制造和表征，用于GaAs MMICS
5. Optimized fabrication of ultra-deep reactive ion etched silicon components for the MEMS rotary engine power system. [D] . Martinez, Fabian Chavez. 2005

机译：优化了用于MEMS旋转发动机动力系统的超深反应离子刻蚀硅组件的制造。
6. Dry Film Photoresist-based Electrochemical Microfluidic Biosensor Platform: Device Fabrication On-chip Assay Preparation and System Operation [O] . Richard Bruch, André Kling, Gerald A. Urban, 2017

机译：基于干膜光致抗蚀剂的电化学微流控生物传感器平台：设备制造芯片上分析准备和系统操作
7. Planarization and fabrication of bridges across deep groves or holes in silicon using a dry film photoresist followed by an etch back [O] . Spiering V.L., Berenschot J.W., Elwenspoek M. 1995

机译：使用干膜光致抗蚀剂然后回蚀刻，在硅的深槽或孔中平面化和制造桥
8. Hole Formation (Etching) in Polymers by Far (Deep) UV High Intensity Laser (Eximer) Radiation Pulses and Its Relevance to Photoresists in Deep UV Photolysis of Polymers [R] . Jellinek, H. G., Partch, R., Kacki, H. 1988

机译：远（深）紫外高强度激光（准分子）辐射脉冲在聚合物中的孔形成（蚀刻）及其与聚合物深紫外光解中光刻胶的相关性

Planarization and fabrication of bridges across deep grooves or holes in silicon using a dry film photoresist followed by an etch back

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