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Control of the Urbach band tail and interband dephasing time with post-growth annealing in low-temperature-grown GaAs

机译:在低温生长的GaAs中控制Urbach带尾和间隙脱模时间

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摘要

Femtosecond four-wave mixing experiments on low-temperature-grown (LT-) GaAs for a range of post-growth annealing temperatures indicate that the Urbach band tail abruptly diminishes above 550°C due to the conversion of As-related point defects to As clusters and that the interband dephasing time is limited by scattering with As point defects for annealing temperatures below 550°C. In addition, we observe a complex interplay of polarization source terms associated with the exciton and Urbach band tail for annealing temperatures below 550°C. These experiments shed light on the carrier dynamics and ultrafast nonlinear optical properties of LT-GaAs.
机译:用于一系列后生长退火温度的低温生长(LT-)GaAs的FemtoSecond四波混合实验表明,由于用作相关点缺陷的转化为Qubach频段尾部突然降低了550°C以上通过用点缺陷的点缺陷散射低于550°C的点缺陷来限制簇。此外,我们遵守与激子和Urbach带尾部相关的偏振源术语的复杂相互作用,用于退火温度低于550°C。这些实验揭示了LT-GaAs的载体动力学和超快非线性光学性能。

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